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China Porous SiC ceramic Manufacturer, Supplier, Factory

Our organization sticks for the principle of "Quality will be the life of your business, and name may be the soul of it" for Porous SiC ceramic, Porous Ceramic Vacuum Chuck, porous vacuum chuck, SIC porous Ceramic, Porous SiC Vacuum Chuck, Leading the trend of this field is our persistent objective. Supplying first class solutions is our intention. To create a beautiful upcoming, we wish to cooperate with all close friends in the home and overseas. Should you have got any interest in our products and solutions, remember to never wait to call us.
Porous SiC ceramic, we've got complete material production line, assembling line , quality control system, and the most importantly, we have many patents technology and experienced technical&production team, specialist sales service team. With all these advantages, we are gonna create"the reputable international brand of nylon monofilaments", and spreading our goods to every corner of the world. We have been keep moving and try our best to serve our customers.

Hot Products

  • CVD SiC coating Heating Element

    CVD SiC coating Heating Element

    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • CVD SiC Focus Ring

    CVD SiC Focus Ring

    VeTek Semiconductor is a leading domestic manufacturer and supplier of CVD SiC focus rings, dedicated to providing high-performance, high-reliability product solutions for the semiconductor industry. VeTek Semiconductor's CVD SiC focus rings use advanced chemical vapor deposition (CVD) technology, have excellent high temperature resistance, corrosion resistance and thermal conductivity, and are widely used in semiconductor lithography processes. Your inquiries are always welcome.
  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • PSS Etching Carrier Plate for Semiconductor

    PSS Etching Carrier Plate for Semiconductor

    VeTek Semiconductor's PSS Etching Carrier Plate for Semiconductor is a high-quality, ultra-pure graphite carrier designed for wafer handling processes. Our carriers have excellent performance and can perform well in harsh environments, high temperatures and harsh chemical cleaning conditions. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.You are welcome to come to China to visit our factory and learn more about our technology and products.
  • CVD SiC coating barrel susceptor

    CVD SiC coating barrel susceptor

    VeTek Semiconductor CVD SiC coating barrel susceptor is the core component of the barrel type epitaxial furnace.With the help of CVD SiC coating barrel susceptor, the quantity and quality of epitaxial growth are greatly improved.VeTek Semiconductor is a professional manufacturer and supplier of SiC Coated Barrel Susceptor, and is at the leading level in China and even in the world.VeTek Semiconductor looks forward to establishing a close cooperative relationship with you in the semiconductor industry.
  • SiC Coated Planetary Susceptor

    SiC Coated Planetary Susceptor

    Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.

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