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China MOCVD Wafer Carriers Manufacturer, Supplier, Factory

Our mission is to become an innovative supplier of high-tech digital and communication devices by providing value added design, world-class manufacturing, and service capabilities for MOCVD Wafer Carriers, SiC Coated Graphite Susceptor for MOCVD, MOCVD Reactor Susceptors, MOCVD SiC Coated Graphite Susceptor, Veeco MOCVD Susceptor, We hope to establish far more organization associations with consumers all over the globe.
MOCVD Wafer Carriers, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've got better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We've been always here working for your demands whenever you need to have.

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  • High purity quartz boat

    High purity quartz boat

    Our High purity quartz boat is made of fused quartz (SiO₂ content ≥ 99.99%). With its excellent resistance to extreme environments, low thermal expansion coefficient, and long life cycle, it has become an irreplaceable key consumable in the semiconductor and new energy industries.
  • CVD SiC coating ring

    CVD SiC coating ring

    The CVD SiC coating ring is one of the important parts of the halfmoon parts. Together with other parts, it forms the SiC epitaxial growth reaction chamber. VeTek Semiconductor is a professional CVD SiC coating ring manufacturer and supplier. According to the customer's design requirements, we can provide the corresponding CVD SiC coating ring at the most competitive price. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • VEECO LED EPI Susceptor

    VEECO LED EPI Susceptor

    VeTek Semiconductor's VEECO LED EPI Susceptor is designed for epitaxial growth of red and yellow LEDs. Advanced materials and CVD SiC coating technology ensure the thermal stability of the Susceptor, making the temperature field uniform during growth, reducing crystal defects, and improving the quality and consistency of epitaxial wafers. It is compatible with VEECO's epitaxial growth equipment and can be seamlessly integrated into the production line. Precise design and reliable performance help improve efficiency and reduce costs. Looking forward to your inquiries.
  • UV LED Epi Susceptor

    UV LED Epi Susceptor

    As a China leading semiconductor susceptor product manufacturer and leader, VeTek Semiconductor has been focusing on various types of suceptor products such as UV LED Epi Susceptor, SiC Coating Susceptor, MOCVD Susceptor. VeTekSemi supports customized product services and looks forward to your consultation.
  • SiN substrate

    SiN substrate

    VeTek Semiconductor is a leading manufacturer and supplier of SiN Substrate products in China. Our Silicon Nitride substrate has excellent thermal conductivity, excellent chemical stability and corrosion resistance, and excellent strength, making it a high-performance material for semiconductor applications. VeTekSemi SiN substrate ensures that you benefit from cutting-edge technology in the field of semiconductor processing, strict quality control, and welcomes your further consultation.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

  • What’s the specific application of TaC coated parts in the semiconductor field?

    Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

  • Why is tantalum carbide (TaC) coating superior to silicon carbide (SiC) coating in SiC single crystal growth? - VeTek semiconductor

    From the application perspective of SiC single crystal growth, this article compares the basic physical parameters of TaC coating and SIC coating, and explains the basic advantages of TaC coating over SiC coating in terms of high temperature resistance, strong chemical stability, reduced impurities, and lower costs.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

  • What is a quartz boat?

    Quartz Boat is a key load-bearing component used in the semiconductor manufacturing process. It is mainly used for high-temperature processing of wafers, such as diffusion, oxidation and annealing. Its excellent thermal stability, low pollution characteristics and corrosion resistance make it an indispensable material in the semiconductor industry. This article will elaborate on the material, physical properties, classification, application scenarios of quartz boat and its differences from PECVD graphite boat.

  • How to prepare CVD TaC coating? - Veteksemicon

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

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