Web Menu

Product Search

Language

Products

China MOCVD Wafer Carriers Manufacturer, Supplier, Factory

Our mission is to become an innovative supplier of high-tech digital and communication devices by providing value added design, world-class manufacturing, and service capabilities for MOCVD Wafer Carriers, SiC Coated Graphite Susceptor for MOCVD, MOCVD Reactor Susceptors, MOCVD SiC Coated Graphite Susceptor, Veeco MOCVD Susceptor, We hope to establish far more organization associations with consumers all over the globe.
MOCVD Wafer Carriers, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've got better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We've been always here working for your demands whenever you need to have.

Related Products

Hot Products

  • silicon carbide ceramic coating graphite heater

    silicon carbide ceramic coating graphite heater

    VeTek semiconductor's Silicon Carbide Ceramic Coating Graphite Heater is a high-performance heater made of graphite substrate and coated with silicon carbon ceramic (SiC) coating on its surface. With its composite material design, this product provides excellent heating solutions in semiconductor manufacturing. Welcome your inquiry.
  • SiC coated sealing ring for Epitaxy

    SiC coated sealing ring for Epitaxy

    Our SiC coated sealing ring for Epitaxy is a high-performance sealing component based on graphite or carbon-carbon composites coated with high-purity silicon carbide (SiC) by chemical vapor deposition (CVD), which combines the thermal stability of graphite with the extreme environmental resistance of SiC, and is designed for semiconductor epitaxial equipment (e.g., MOCVD, MBE).
  • Rapid Thermal Annealing Susceptor

    Rapid Thermal Annealing Susceptor

    VeTek Semiconductor is a leading Rapid Thermal Annealing Susceptor manufacturer and supplier in China, focusing on providing high-performance solutions for the semiconductor industry. We have many years of deep technical accumulation in the field of SiC coating materials. Our Rapid Thermal Annealing Susceptor has excellent high temperature resistance and excellent thermal conductivity to meet the needs of wafer epitaxial manufacturing. You are welcome to visit our factory in China to learn more about our technology and products.
  • Silicon Carbide Wafer Boat for Horizontal Furnace

    Silicon Carbide Wafer Boat for Horizontal Furnace

    SiC wafer boat has high requirement in material purity.Vetek Semiconductor supply SiC purity ＞99.96% recrystallized SiC to this product.VeTek Semiconductor is a professional manufacturer and supplier in China for silicon carbide wafer boat for horizontal furnace, with years of experience in R&D and production, can control the quality well and offer a competitive price. You can rest assured to buy the silicon carbide wafer boat for horizontal furnace from us.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • Silicon Carbide Ceramic Wafer Boat

    Silicon Carbide Ceramic Wafer Boat

    VeTek Semiconductor specializes in providing high-quality wafer boats, pedestals and custom wafer carriers in vertical/column and horizontal configurations to meet various semiconductor process requirements. As a leading manufacturer and supplier of silicon carbide coating films, our silicon carbide ceramic wafer boat is favored by the European and American markets for their high cost-effectiveness and excellent quality, and are widely used in advanced semiconductor manufacturing processes. VeTek Semiconductor is committed to establishing long-term and stable cooperative relationships with global customers, and especially hopes to become your reliable semiconductor process partner in China.

  • Chinese companies are reportedly developing 5nm chips with Broadcom!

    According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

  • How thin can the Taiko process make silicon wafers?

    The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

  • Exploratory application of 3D printing technology in the semiconductor industry

    In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

  • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

    This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

Related Search

MOCVD Wafer Carriers for Semiconductor Industry

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept