Products

Silicon Carbide Coating

VeTek Semiconductor specializes in the production of ultra pure Silicon Carbide Coating products, these coatings are designed to be applied to purified graphite, ceramics, and refractory metal components.


Our high purity coatings are primarily targeted for use in the semiconductor and electronics industries. They serve as a protective layer for wafer carriers, susceptors, and heating elements, safeguarding them from corrosive and reactive environments encountered in processes such as MOCVD and EPI. These processes are integral to wafer processing and device manufacturing. Additionally, our coatings are well-suited for applications in vacuum furnaces and sample heating, where high vacuum, reactive, and oxygen environments are encountered.


At VeTek Semiconductor, we offer a comprehensive solution with our advanced machine shop capabilities. This enables us to manufacture the base components using graphite, ceramics, or refractory metals and apply the SiC or TaC ceramic coatings in-house. We also provide coating services for customer-supplied parts, ensuring flexibility to meet diverse needs.


Our Silicon Carbide Coating products are widely used in Si epitaxy, SiC epitaxy, MOCVD system, RTP/RTA process, etching process, ICP/PSS etching process, process of various LED types, including blue and green LED, UV LED and deep-UV LED etc.,which is adapted to equipment from LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI and so on.


Reactor parts we can do:


Aixtron G5 MOCVD Susceptors


Silicon Carbide Coating several unique advantages:

Silicon Carbide Coating several unique advantages



VeTek Semiconductor Silicon Carbide Coating Parameter

Basic physical properties of CVD SiC coating
Property Typical Value
Crystal Structure FCC β phase polycrystalline, mainly (111) oriented
SiC coating Density 3.21 g/cm³
SiC coatingHardness 2500 Vickers hardness(500g load)
Grain SiZe 2~10μm
Chemical Purity 99.99995%
Heat Capacity 640 J·kg-1·K-1
Sublimation Temperature 2700℃
Flexural Strength 415 MPa RT 4-point
Young' s Modulus 430 Gpa 4pt bend, 1300℃
Thermal Conductivity 300W·m-1·K-1
Thermal Expansion(CTE) 4.5×10-6K-1

CVD SIC FILM CRYSTAL STRUCTURE

CVD SIC FILM CRYSTAL STRUCTURE



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Solid SiC Etching Focusing Ring

Solid SiC Etching Focusing Ring

Solid SiC Etching Focusing Ring is one of the core components of wafer etching process, which plays a role in fixing wafer, focusing plasma and improving wafer etching uniformity. As the leading SiC Focusing Ring manufacturer in China, VeTek Semiconductor has advanced technology and mature process, and manufactures Solid SiC Etching Focusing Ring that fully meets the needs of end customers according to customer requirements. We look forward to your inquiry and becoming each other's long-term partners.
As a professional Silicon Carbide Coating manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Coating made in China, you can leave us a message.
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