Web Menu

Product Search

Language

Products

China TBC thermal barrier coating Manufacturer, Supplier, Factory

Well-run gear, qualified revenue workforce, and superior after-sales companies; We've been also a unified huge loved ones, anyone persist with the organization benefit "unification, determination, tolerance" for TBC thermal barrier coating, MAX Phase Nanopowder, Phase Nanopowder, Porous Ceramic Vacuum Chuck, Nano powder, We fully welcome shoppers from all around the world to ascertain stable and mutually effective enterprise interactions, to have a dazzling long run jointly.
TBC thermal barrier coating, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've got better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We've been always here working for your demands whenever you need to have.

Related Products

Hot Products

  • MOCVD Susceptor

    MOCVD Susceptor

    MOCVD Susceptor is characteristed with planetary disc and profesional for its stable performance in epitaxy. Vetek semiconductor has rich experience in machining and CVD SiC coating of this product, welcome to communicate with us about real cases.
  • silicon carbide ceramic coating heater

    silicon carbide ceramic coating heater

    The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process.
  • Porous Graphite

    Porous Graphite

    As a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. As a professional manufacturer of Porous Graphite, VeTek Semiconductor is committed to providing high-quality Porous Graphite products at competitive prices, welcome your further inquiry.
  • MOCVD epitaxial wafer susceptor

    MOCVD epitaxial wafer susceptor

    VeTek Semiconductor has been engaged in the semiconductor epitaxial growth industry for a long time and has rich experience and process skills in MOCVD epitaxial wafer susceptor products. Today, VeTek Semiconductor has become China's leading MOCVD epitaxial wafer susceptor manufacturer and supplier, and the wafer susceptors it provides have played an important role in the manufacturing of GaN epitaxial wafers and other products.
  • Soft Felt for Furnace Heat Insulation

    Soft Felt for Furnace Heat Insulation

    VeTek Semiconductor is committed to providing high-quality Soft Felt for Furnace Heat Insulation. It is made of carbon fiber or graphite fiber interwoven with each other, and has excellent thermal insulation and high temperature resistance. Whether it is in industrial heating furnaces, high-temperature equipment or other occasions that require thermal insulation, our Soft Felt for Furnace Heat Insulation can meet your needs. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you.
  • SiC Coated Wafer Carrier for Etching

    SiC Coated Wafer Carrier for Etching

    As a leading Chinese manufacturer and supplier of Silicon Carbide Coating products, Veteksemicon's SiC Coated Wafer Carrier for Etching plays an irreplaceable core role in the etching process with its excellent high temperature stability, outstanding corrosion resistance and high thermal conductivity.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

    In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

  • Why does 3C-SiC stand out among many SiC polymorphs? - VeTek Semiconductor

    Silicon carbide (SiC) is a high-precision semiconductor material known for its excellent properties like high temperature resistance, corrosion resistance, and high mechanical strength. It has over 200 crystal structures, with 3C-SiC being the only cubic type, offering superior natural sphericity and densification compared to other types. 3C-SiC stands out for its high electron mobility, making it ideal for MOSFETs in power electronics. Additionally, it shows great potential in nanoelectronics, blue LEDs, and sensors.

  • What is The Third-generation Semiconductor Industry?

    Semiconductor materials can be classified into three generations in chronological order. The first generation consists of common elemental materials such as germanium and silicon, which are characterized by convenient switching and are generally used in integrated circuits. The second-generation compound semiconductors such as gallium arsenide and indium phosphide are mainly used in luminescent and communication materials.

  • Application and research of silicon carbide ceramics in the field of photovoltaics - Vetek Semiconductor

    With the development of the solar photovoltaic industry, diffusion furnaces and LPCVD furnaces are the main equipment for the production of solar cells, which directly affect the efficient performance of solar cells. Based on the comprehensive product performance and usage cost, silicon carbide ceramic materials have more advantages in the field of solar cells than quartz materials. The application of silicon carbide ceramic materials in the photovoltaic industry can greatly help photovoltaic enterprises reduce auxiliary material investment costs, improve product quality and competitiveness. The future trend of silicon carbide ceramic materials in the photovoltaic field is mainly towards higher purity, stronger load-bearing capacity, higher loading capacity, and lower cost.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept