Web Menu

Product Search

Language

Products

China Silicon Wafer Production Manufacturer, Supplier, Factory

We are also specializing in improving the things management and QC method in order that we could retain terrific edge inside the fiercely-competitive small business for Silicon Wafer Production, Silicon Based Epitaxy, Graphite Susceptors for Silicon, Epitaxial Susceptor, Epitaxial Wafer Carrier, We are now looking forward to even greater cooperation with overseas customers based on mutual benefits. If you are interested in any of our products, please feel free to contact us for more details.
Silicon Wafer Production, We always adhere to follow the honesty, mutual benefit, common development, after years of development and the tireless efforts of all staff, now has perfect export system, diversified logistics solutions, extensive meet customer shipping, air transport, international express and logistics services. Elaborate one-stop sourcing platform for our customers!

Related Products

Hot Products

  • ALD Planetary Susceptor

    ALD Planetary Susceptor

    ALD process,means Atomic Layer Epitaxy process. Vetek Semiconductor and ALD system manufacturers have developed and produced SiC coated ALD Planetary Susceptors that meet the high requirements of the ALD process to evenly distribute the airflow over the substrate. At the same time, our high purity CVD SiC coating ensures purity in the process. Welcome to discuss cooperation with us.
  • TaC Coated Graphite Wafer Carrier

    TaC Coated Graphite Wafer Carrier

    VeTek Semiconductor has carefully designed TaC Coated Graphite Wafer Carrier for customers. It is composed of high-purity graphite and TaC coating, which is suitable for various wafer epitaxial wafer processing. We have been specialized in SiC and TaC coating for many years. Compared with SiC coating, Our TaC coated graphite wafer carrier has a higher temperature resistance and wear-resistant. We look forward to becoming your long-term partner in China.
  • TaC Coating Guide Ring

    TaC Coating Guide Ring

    VeTek Semiconductor's TaC Coating Guide Ring is created by applying tantalum carbide coating onto graphite parts using a highly advanced technique called chemical vapor deposition (CVD). This method is well-established and offers exceptional coating properties. By utilizing the TaC Coating Guide Ring, the lifespan of graphite components can be significantly extended, the movement of graphite impurities can be suppressed, and the SiC and AIN single crystal quality can be reliably maintained. Welcome to inquiry us.
  • SiC Wafer Boat

    SiC Wafer Boat

    The SiC wafer boat is used to carry the wafer,mainly for the oxidation and diffusion process, to ensure that the temperature can be evenly distributed on the wafer surface. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. Vetek semiconductor is committed to providing quality products at competitive prices.
  • High purity graphite power

    High purity graphite power

    Vetek Semiconductor offers High purity graphite power that is a high quality product with a purity of up to 5ppm and meets the highest industry standards. Customizable particle form, mainly used for silicon carbide powder and diamond synthesis, suitable for semiconductor, electronics and high-tech industries. Welcome to inquiry us!
  • Tantalum Carbide Coating Ring

    Tantalum Carbide Coating Ring

    VeTek semiconductor Tantalum Carbide Coating Ring is a indispensable component in the semiconductor industry, specifically in the etching of SiC wafers. Its combination of a graphite base and TaC coating ensures superior performance in high-temperature and chemically aggressive environments. With its enhanced thermal stability, corrosion resistance, and mechanical strength, the Tantalum Carbide Coated Ring helps semiconductor manufacturers achieve precision, reliability, and high-quality results in their production processes.

  • Why is SiC coating a key core material for SiC epitaxial growth?

    This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

  • What is TaC Coating ? - VeTek Semiconductor

    This article mainly introduces the product types, product characteristics and main functions of TaC Coating in semiconductor processing, and makes a comprehensive analysis and interpretation of TaC Coating products as a whole.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

  • Exploratory application of 3D printing technology in the semiconductor industry

    In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

  • How to prepare CVD TaC coating? - Veteksemicon

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept