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China SiC coating collector top Manufacturer, Supplier, Factory

As a way to present you with ease and enlarge our enterprise, we also have inspectors in QC Workforce and assure you our greatest support and solution for SiC coating collector top, SiC Coated Plate Carriers for MOCVD, Aixtron SiC Coating Collector Top, SiC(silicon carbide) coating, Aixtron reactor, Our main objectives are to deliver our clients worldwide with good quality, competitive cost, happy delivery and superb providers.
SiC coating collector top, During in 11 years, We now have participated in more than 20 exhibitions, obtains the highest praise from each customer. Our company has been devoting that "customer first" and committed to helping customers expand their business, so that they become the Big Boss !

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  • 4H Semi Insulating Type SiC Substrate

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    Vetek Semiconductor is a professional 4H Semi Insulating Type SiC Substrate supplier and manufacturer in China. Our 4H Semi Insulating Type SiC Substrate is widely used in key components of semiconductor manufacturing equipment. Welcome your further inquiries.
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    Silicon Carbide Wafer Chuck

    As a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Welcome your further consultation.
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    VeTek semiconductor is a leading semiconductor quartz tank manufacturer and factory in China. In fact, quartz tank is particularly important in the wet processing used in wafer manufacturing. Welcome your further inquiries.
  • CVD SiC Coated Skirt

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    VeTek Semiconductor is a leading manufacturer and leader of CVD SiC Coated Skirt in China. Our main CVD SiC coating products include CVD SiC coated Skirt, CVD SiC Coating Ring. Looking forward to your contact.
  • SiC Crystal Growth Porous Graphite

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    As a China leading SiC Crystal Growth Porous Graphite manufacturer , VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite's investment and R&D, our Porous Graphite products have won high praise from European and American customers. Looking forward to your contact.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

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  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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