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With our rich working experience and thoughtful companies, we have now been recognized as being a trustworthy supplier for a lot of global potential buyers for Semiconductor Components, Aixtron G5 MOCVD system, Nuflare systems, TEL CVD systems, Veeco systems, We wholeheartedly welcome consumers all over the entire world appear to go to our manufacturing unit and have a win-win cooperation with us!
Semiconductor Components, Our company is an international supplier on this kind of merchandise. We present an amazing selection of high-quality products. Our goal is to delight you with our distinctive collection of mindful solutions while providing value and excellent service. Our mission is simple: To offer the best solutions and service to our customers at the lowest prices possible.

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  • SiN substrate

    SiN substrate

    VeTek Semiconductor is a leading manufacturer and supplier of SiN Substrate products in China. Our Silicon Nitride substrate has excellent thermal conductivity, excellent chemical stability and corrosion resistance, and excellent strength, making it a high-performance material for semiconductor applications. VeTekSemi SiN substrate ensures that you benefit from cutting-edge technology in the field of semiconductor processing, strict quality control, and welcomes your further consultation.
  • High purity graphite soft felt

    High purity graphite soft felt

    VeTek Semiconductor is a leading manufacturer and supplier of high purity graphite soft felt from China. The high purity graphite soft felt is widely used in semiconductor, photovoltaic and other fields. Whether vacuum high pressure gas quenching furnace, vacuum sintering furnace, single crystal silicon furnace, silicon carbide growth furnace and other furnace types, can provide excellent thermal insulation performance. According to user requirements, we can process various shapes of high purity graphite soft felt, the surface of the product can also be coating treatment. Looking forward to your inquiry.
  • UV LED Epi Susceptor

    UV LED Epi Susceptor

    As a China leading semiconductor susceptor product manufacturer and leader, VeTek Semiconductor has been focusing on various types of suceptor products such as UV LED Epi Susceptor, SiC Coating Susceptor, MOCVD Susceptor. VeTekSemi supports customized product services and looks forward to your consultation.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • MAX Phase Nanopowder

    MAX Phase Nanopowder

    Veteksemi’s Semiconductor MAX phase nanopowder offers exceptional thermal and electrical properties, ideal for advanced electronics and materials science applications. With superior oxidation resistance and high-temperature stability, Veteksemi's nanopowder is the perfect solution for innovative semiconductor technologies.
  • High Purity Graphite Paper

    High Purity Graphite Paper

    The high purity graphite paper provided by VeTek Semiconductor is a reliable and efficient sealing solution. High-purity graphite paper is a sealing material made of advanced graphite materials with excellent performance and reliability. It has excellent high-temperature resistance and can withstand sealing requirements under extreme temperature conditions. Welcome to inquire at any time. We look forward to becoming your long-term partner in China.

  • What is an Electrostatic Chuck (ESC)?

    In the high-stakes world of semiconductor fabrication, precision and stability are everything—and that's where the Electrostatic Chuck (ESC) steps in. Far more than just a holding tool, the ESC uses electrostatic forces to securely clamp wafers during critical processes like etching, deposition, and ion implantation. But how does it actually work? Why is it superior to traditional mechanical clamping? And what role does it play in achieving nanoscale accuracy and throughput efficiency? Welcome to read.

  • Why is tantalum carbide (TaC) coating superior to silicon carbide (SiC) coating in SiC single crystal growth? - VeTek semiconductor

    From the application perspective of SiC single crystal growth, this article compares the basic physical parameters of TaC coating and SIC coating, and explains the basic advantages of TaC coating over SiC coating in terms of high temperature resistance, strong chemical stability, reduced impurities, and lower costs.

  • What Exactly is the Third Generation Semiconductor?

    When you see the third-generation semiconductors, you will surely wonder what the first and second generations were. The "generation" here is classified based on the materials used in semiconductor manufacturing.

  • What is The Third-generation Semiconductor Industry?

    Semiconductor materials can be classified into three generations in chronological order. The first generation consists of common elemental materials such as germanium and silicon, which are characterized by convenient switching and are generally used in integrated circuits. The second-generation compound semiconductors such as gallium arsenide and indium phosphide are mainly used in luminescent and communication materials.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • ‌Optimization of Defects and Purity in SiC Crystals by TaC Coating

    The TaC coating almost completely eliminates the carbon encapsulation phenomenon by isolating the direct contact between the graphite crucible and the SiC melt, significantly reducing the defect density of microtubes

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