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China MOCVD process Manufacturer, Supplier, Factory

We rely upon strategic thinking, constant modernisation in all segments, technological advances and of course upon our employees that directly participate inside our success for MOCVD process, MOCVD epitaxial wafer susceptor, MOCVD Susceptor for Epitaxial Growth, SiC Wafer Susceptor for MOCVD, SiC coating, By more than 8 years of company, now we have accumulated rich experience and advanced technologies from the generation of our merchandise.
MOCVD process, During in 11 years, We now have participated in more than 20 exhibitions, obtains the highest praise from each customer. Our company has been devoting that "customer first" and committed to helping customers expand their business, so that they become the Big Boss !

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  • SiC Coated MOCVD Susceptor

    SiC Coated MOCVD Susceptor

    Veteksemicon's SiC Coated MOCVD Susceptor is a device with excellent process, durability and reliability. They can withstand high temperature and chemical environments, maintain stable performance and long life, thereby reducing the frequency of replacement and maintenance and improving production efficiency. Our MOCVD Epitaxial Susceptor is renowned for its high density, excellent flatness and excellent thermal control, making it the preferred equipment in harsh manufacturing environments. Looking forward to cooperating with you.Welcome to consult at any time.
  • Contiguous Wafer Boat

    Contiguous Wafer Boat

    Vetek Semiconductor Contiguous Wafer Boat is an advanced equipment for semiconductor processing. The product structure is carefully designed to ensure efficient processing and production of precision wafers. VeTekSemi supports customized product solutions and looks forward to your consultation.
  • Alumina Ceramic Vacuum Chuck

    Alumina Ceramic Vacuum Chuck

    VeTek Semiconductor is a professional Alumina Ceramic Vacuum Chuck manufacturer and factory in China. Alumina Ceramic Vacuum Chuck uses high-purity aluminum oxide ceramics with excellent heat resistance, chemical resistance and mechanical strength. It is mainly used to fix and support wafers and substrates. It is a high-performance equipment for semiconductor processing. Welcome your further inquiries.
  • SiC Cantilever Paddle

    SiC Cantilever Paddle

    VeTek Semiconductor's SiC Cantilever Paddle is used in heat treatment furnaces for handling and supporting wafer boats. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.
  • Isostatic Graphite Crucible

    Isostatic Graphite Crucible

    As a leading supplier of customized graphite crucibles in China, VeTek Semiconductor mainly provides Isostatic Graphite Crucible, SiC Coated Graphite Crucible Deflector, Glassy Carbon Coated Graphite Crucible, etc. Our graphite crucibles are made of high-purity graphite raw materials and manufactured through precision technology, with excellent high temperature resistance, corrosion resistance and thermal conductivity. Welcome to consult us.
  • SiC Coated Top Plate for LPE PE2061S

    SiC Coated Top Plate for LPE PE2061S

    VeTek Semiconductor has been deeply engaged in SiC coating products for many years and has become a leading manufacturer and supplier of SiC Coated Top Plate for LPE PE2061S in China. The SiC Coated Top Plate for LPE PE2061S we provide is designed for LPE silicon epitaxial reactors and is located on the top together with the barrel base. This SiC Coated Top Plate for LPE PE2061S has excellent characteristics such as high purity, excellent thermal stability and uniformity, which helps to grow high-quality epitaxial layers. No matter what product you need, we look forward to your inquiry.

  • What is Silicon Carbide Ceramic?

    Silicon carbide ceramics, commonly known as SiC ceramics, are a versatile material with unique properties and a wide range of applications in various industries. The following is a detailed discussion of its material composition, physical properties, specific applications and advantages in semiconductor coating processes, and common problems encountered during processing.

  • Why is SiC coating a key core material for SiC epitaxial growth?

    This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

  • From the manufacturing process of electrostatic suction cups to mass production manufacturers

    The Dechuck principle of the Electrostatic Chuck is a key part of its workflow that involves electrostatic force elimination and wafer release mechanisms.

  • What is tantalum carbide(TaC)？

    Tantalum Carbide (TaC) is a high-performance ceramic material known for its extremely high hardness, high melting point and excellent chemical stability. It is widely used in semiconductor, aerospace and other industries requiring extreme heat, wear and corrosion resistance. This article will analyze in detail the structure, physical properties, and specific uses of the finished product in semiconductor manufacturing.

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