Web Menu

Product Search

Language

Products

China TaC Chuck Manufacturer, Supplier, Factory

Our pursuit and company goal is to "Always satisfy our customer requirements". We continue to develop and design superior quality products for both our old and new customers and achieve a win-win prospect for our clients as well as us for TaC Chuck, TaC Coated Chuck, CVD TAC COATING, TAC COATING, Aixtron Silicon Carbide Epitaxy, Never-ending improvement and striving for 0% deficiency are our two main good quality policies. Should you need anything, do not hesitate to call us.
TaC Chuck, Our company insists on the principle of "Quality First, Sustainable Development", and takes "Honest Business, Mutual Benefits" as our developable goal. All members sincerely thank all old and new customers' support. We'll keep working hard and offering you the highest-quality goods and service.

Related Products

Hot Products

  • SiC Coated Graphite Crucible Deflector

    SiC Coated Graphite Crucible Deflector

    The SiC coated graphite crucible deflector is a key component in the single crystal furnace equipment, its task is to guide the molten material from the crucible to the crystal growth zone smoothly, and ensure the quality and shape of the single crystal growth.Vetek semiconductor can provide both graphite and SiC coating material.Welcome to contact us for more details.
  • Silicon Carbide Wafer Chuck

    Silicon Carbide Wafer Chuck

    As a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Welcome your further consultation.
  • CVD SiC Coating Protector

    CVD SiC Coating Protector

    Vetek Semiconductor's CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.
  • Aluminum Nitride ceramic Disc

    Aluminum Nitride ceramic Disc

    Vetek Semiconductor aluminum nitride ceramics disc is a high-performance material known for its excellent properties of high thermal conductivity & electrical insulation, especially suitable for demanding electrical applications. Aluminum nitride ceramic discs are stable at high temperatures in a variety of inert environments. Welcome to communicate with us.
  • Silicon Carbide SiC wafer boat

    Silicon Carbide SiC wafer boat

    Veteksemicon SiC wafer boats are widely used in critical high-temperature processes in semiconductor manufacturing, serving as reliable carriers for oxidation, diffusion, and annealing processes for silicon-based integrated circuits. They also excel in the third-generation semiconductor sector, perfectly suited for demanding processes such as epitaxial growth (EPI) and metal-organic chemical vapor deposition (MOCVD) for SiC and GaN power devices. They also support the high-temperature fabrication of high-efficiency solar cells in the photovoltaic industry. Looking forward to your further consultation.
  • Tantalum Carbide Coating Support

    Tantalum Carbide Coating Support

    As a professional Tantalum Carbide Coating Support product manufacturer and factory in China, VeTek Semiconductor Tantalum Carbide Coating Support is usually used for surface coating of structural components or support components in semiconductor equipment, especially for surface protection of key equipment components in semiconductor manufacturing processes such as CVD and PVD. Welcome your further consultation.

  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

  • Do you know about MOCVD Susceptor?

    This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • What is a quartz boat?

    Quartz Boat is a key load-bearing component used in the semiconductor manufacturing process. It is mainly used for high-temperature processing of wafers, such as diffusion, oxidation and annealing. Its excellent thermal stability, low pollution characteristics and corrosion resistance make it an indispensable material in the semiconductor industry. This article will elaborate on the material, physical properties, classification, application scenarios of quartz boat and its differences from PECVD graphite boat.

  • What Exactly is the Third Generation Semiconductor?

    When you see the third-generation semiconductors, you will surely wonder what the first and second generations were. The "generation" here is classified based on the materials used in semiconductor manufacturing.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept