Web Menu

Product Search

Language

Products

China SiN film Manufacturer, Supplier, Factory

Every single member from our large efficiency profits team values customers' requirements and organization communication for SiN film, SiN susbstrate, Silicon Nitride, Silicon Nitride susbstrate, High purity SiN susbstrate, In addition, we would properly guideline the shoppers about the application techniques to adopt our products and solutions as well as the way to select appropriate materials.
SiN film, We have been in operation for more than 10 years. We have been dedicated to quality products and solutions and consumer support. We currently own 27 product utility and design patents. We invite you to visit our company for a personalized tour and advanced business guidance.

Related Products

Hot Products

  • Graphite Rotating Susceptor

    Graphite Rotating Susceptor

    High purity graphite rotating susceptor plays an important role in the epitaxial growth of gallium nitride (MOCVD process). VeTek Semiconductor is a leading graphite rotating susceptor manufacturer and supplier in China. We have developed many high-purity graphite products based on high-purity graphite materials, which fully meet the requirements of the semiconductor industry. VeTek Semiconductor looks forward to becoming your partner in Rotating Graphite susceptor.
  • VEECO LED EPI Susceptor

    VEECO LED EPI Susceptor

    VeTek Semiconductor's VEECO LED EPI Susceptor is designed for epitaxial growth of red and yellow LEDs. Advanced materials and CVD SiC coating technology ensure the thermal stability of the Susceptor, making the temperature field uniform during growth, reducing crystal defects, and improving the quality and consistency of epitaxial wafers. It is compatible with VEECO's epitaxial growth equipment and can be seamlessly integrated into the production line. Precise design and reliable performance help improve efficiency and reduce costs. Looking forward to your inquiries.
  • Silicon Carbide Robot Arm

    Silicon Carbide Robot Arm

    Our silicon carbide (SiC) robotic arm is designed for high-performance wafer handling in advanced semiconductor manufacturing. Made of high-purity silicon carbide, this robotic arm offers exceptional resistance to high temperatures, plasma corrosion, and chemical attack, ensuring reliable operation in demanding cleanroom environments. Its exceptional mechanical strength and dimensional stability enable precise wafer handling while minimizing contamination risks, making it an ideal choice for MOCVD, epitaxy, ion implantation, and other critical wafer handling applications. We welcome your inquiries.
  • SiC Diffusion Furnace Tube

    SiC Diffusion Furnace Tube

    As a leading manufacturer and supplier of diffusion furnace equipment in China, VeTek Semiconductor SiC Diffusion Furnace Tube has significantly high bending strength, excellent resistance to oxidation, corrosion resistance, high wear resistance, and excellent high-temperature mechanical properties. Making it an indispensable equipment material in diffusion furnace applications. VeTek Semiconductor is committed to manufacturing and supplying high-quality SiC Diffusion Furnace Tube, and welcomes your further inquiries.
  • High Purity SiC Cantilever Paddle

    High Purity SiC Cantilever Paddle

    VeTek Semiconductor is a leading manufacturer and supplier of High Purity SiC Cantilever Paddle product in China. High Purity SiC Cantilever Paddles are commonly used in semiconductor diffusion furnaces as wafer transfer or loading platforms.
  • SiC Cantilever Paddle

    SiC Cantilever Paddle

    VeTek Semiconductor's SiC Cantilever Paddle is used in heat treatment furnaces for handling and supporting wafer boats. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

  • How to prepare CVD TaC coating? - Veteksemicon

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

  • Exploratory application of 3D printing technology in the semiconductor industry

    In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept