China SiC coated wafer holder Manufacturer, Supplier, Factory

The barrel type epitaxial wafer heating base is a product with complicated processing technology, which is very challenging to machining equipment and ability. Vetek semiconductor has advanced equipment and rich experience in processing SiC coated graphite barrel susceptor for EPI, can provide the same as the original factory life, more cost-effective epitaxial barrels.If you are interested in our datas,pls no hesitate to contact us.

VETEK High Purity Quartz Wafer Boat for TEL semiconductor equipment is manufactured from semiconductor-grade quartz material and designed for wafer handling in high-temperature processes such as diffusion, oxidation, annealing, and CVD. With excellent thermal stability, chemical resistance, and low contamination characteristics, it provides reliable wafer support for semiconductor manufacturing applications.

Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.

CVD TaC coating planetary SiC epitaxial susceptor is one of the core components of MOCVD planetary reactor. Through CVD TaC coating planetary SiC epitaxial susceptor, the large disk orbits and the small disk rotates, and the horizontal flow model is extended to multi-chip machines, so that it has both the high-quality epitaxial wavelength uniformity management and defect optimization of single-chip machines and the production cost advantages of multi-chip machines.VeTek Semiconductor can provide customers with highly customized CVD TaC coating planetary SiC epitaxial susceptor. If you also want to make a planetary MOCVD furnace like Aixtron, come to us!

Vetek CVD TaC Coated Susceptor is a precision solution specifically developed for high-performance MOCVD epitaxial growth. It demonstrates excellent thermal stability and chemical inertness in extreme high-temperature environments of 1600°C. Relying on VETEK's rigorous CVD deposition process, we are committed to improving wafer growth uniformity, extending the service life of core components, and providing stable and reliable performance guarantees for your every batch of semiconductor production.

Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.