Web Menu

Product Search

Language

Products

China Rigid Felt for Furnace Heat Insulation Manufacturer, Supplier, Factory

Good quality comes initial; company is foremost; small business is cooperation" is our business philosophy which is frequently observed and pursued by our business for Rigid Felt for Furnace Heat Insulation, Soft Felt for Furnace Heat Insulation, High Purity Graphite Rigid Felt, Hard Composite Carbon Fiber Felt, Soft Felt, We give priority to good quality and customer fulfillment and for this we follow stringent excellent control measures. We've in-house testing facilities where our goods are tested on each and every aspect at different processing stages. Owning to latest technologies, we facilitate our prospects with custom-made production facility.
Rigid Felt for Furnace Heat Insulation, Welcome to visit our company, factory and our showroom where displays various hair solutions that will meet your expectation. Meanwhile, it is convenient to visit our website, and our sales staff will try their best to deliver you the best service. Be sure to contact us if you want more information. Our aim is to help customers realize their goals. We are making great efforts to achieve this win-win situation.

Related Products

Hot Products

  • Graphite Rotating Susceptor

    Graphite Rotating Susceptor

    High purity graphite rotating susceptor plays an important role in the epitaxial growth of gallium nitride (MOCVD process). VeTek Semiconductor is a leading graphite rotating susceptor manufacturer and supplier in China. We have developed many high-purity graphite products based on high-purity graphite materials, which fully meet the requirements of the semiconductor industry. VeTek Semiconductor looks forward to becoming your partner in Rotating Graphite susceptor.
  • SiC Coating Inlet Ring

    SiC Coating Inlet Ring

    Vetek Semiconductor excels in collaborating closely with clients to craft bespoke designs for SiC Coating Inlet Ring tailored to specific needs. These SiC Coating Inlet Ring are meticulously engineered for diverse applications such as CVD SiC equipment and Silicon carbide epitaxy. For tailored SiC Coating Inlet Ring solutions, do not hesitate to reach out to Vetek Semiconductor for personalized assistance.
  • PSS Etching Carrier Plate for Semiconductor

    PSS Etching Carrier Plate for Semiconductor

    VeTek Semiconductor's PSS Etching Carrier Plate for Semiconductor is a high-quality, ultra-pure graphite carrier designed for wafer handling processes. Our carriers have excellent performance and can perform well in harsh environments, high temperatures and harsh chemical cleaning conditions. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.You are welcome to come to China to visit our factory and learn more about our technology and products.
  • CVD SiC coating Dummy wafer

    CVD SiC coating Dummy wafer

    As a leading Chinese sic wafer manufacturers and suppliers, VeTek Semiconductor CVD SiC coating Dummy wafer is a specialized tool in semiconductor manufacturing, mainly used for the purpose of silicon wafer testing and wafer testing process. Your further inquiries are welcome.
  • Monocrystalline pulling Crucible

    Monocrystalline pulling Crucible

    Graphite crucible is an important part of Monocrystalline Pulling Crucibles in the process of achieving monocrystalline silicon ingot growth.Vetek semiconductor's crucibles are intricately engineered to meet the rigorous requirements set by the semiconductor industry.We are committed to producing and supplying crystal growth graphite crucibles that excel in performance, quality, and cost-effectiveness to meet the evolving needs of the industry.Welcome to inquiry us.
  • CVD TaC Coating Cover

    CVD TaC Coating Cover

    CVD TaC coating cover provided by VeTek Semiconductor is a highly specialized component designed specifically for demanding applications. With its advanced features and exceptional performance, our CVD TaC coating cover offers several key advantages.Our CVD TaC coating cover provides the necessary protection and performance required for success.We looking forward to exploring potential cooperation with you!

  • Do you know about MOCVD Susceptor?

    This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

  • Porous Tantalum Carbide: A new generation of materials for SiC crystal growth

    VeTek Semiconductor's Porous Tantalum Carbide, as a new generation of SiC crystal growth material, has many excellent product properties and plays a key role in a variety of semiconductor processing technologies.

  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • Uses of solid silicon carbide

    Solid silicon carbide (SiC) has become one of the key materials in semiconductor manufacturing due to its unique physical properties. The following is an analysis of its advantages and practical value based on its physical properties and its specific applications in semiconductor equipment (such as wafer carriers, shower heads, etching focus rings, etc.).

  • ALD Atomic Layer Deposition Recipe

    Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept