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China Oxidation furnace Manufacturer, Supplier, Factory

We now have quite a few superb workers customers very good at marketing and advertising, QC, and working with forms of troublesome dilemma while in the creation approach for Oxidation furnace, Wafer Baffles, Wafer Process Boats, Silicon Carbide Coated Ceramic Wafer Boats, Ceramic Wafer Pedestals, We aim at Ongoing system innovation, management innovation, elite innovation and market innovation, give full play to the overall advantages, and constantly improve service quality.
Oxidation furnace, With excellent merchandise, high quality service and sincere attitude of service, we ensure customer satisfaction and help customers create value for mutual benefit and create a win-win situation. Welcome customers all over the world to contact us or visit our company. We are going to satisfy you with our expert service!

Hot Products

  • Porous SiC Ceramic Plate

    Porous SiC Ceramic Plate

    Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
  • silicon carbide ceramic coating heater

    silicon carbide ceramic coating heater

    The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process.
  • SiC coated Satellite cover for MOCVD

    SiC coated Satellite cover for MOCVD

    SiC coated satellite cover for MOCVD plays an irreplaceable role in ensuring high-quality epitaxial growth on wafers due to its extremely high temperature resistance, excellent corrosion resistance and outstanding oxidation resistance.
  • High Purity Quartz Crucible

    High Purity Quartz Crucible

    High purity quartz crucible is essential core component in advanced semiconductor manufacturing processes, especially for applications that require extremely high thermal stability, chemical purity, and dimensional accuracy. Veteksemicon offers superior high purity quartz crucibles designed to meet the extreme demands of semiconductor processes.
  • Silicon-based GaN Epitaxial Susceptor

    Silicon-based GaN Epitaxial Susceptor

    The silicon-based GaN epitaxial Susceptor is the core component required for GaN epitaxial production. Veteksemicon silicon-based GaN epitaxial Susceptor is specially designed for silicon-based GaN epitaxial reactor system, with advantages such as high purity, excellent high temperature resistance and corrosion resistance. Welcome your further consultation.
  • CVD SiC Coating Protector

    CVD SiC Coating Protector

    Vetek Semiconductor's CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.

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