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continue to improve, to ensure product quality in line with market and customer standard requirements. Our company has a quality assurance system have been established for LED epitaxy process, MOCVD Susceptor with TaC Coating, SiC coating parts, UV LED Susceptor, Tantalum Carbide Coating, We recognize your enquiry and it truly is our honor to work with each and every pal globally.
LED epitaxy process, With excellent merchandise, high quality service and sincere attitude of service, we ensure customer satisfaction and help customers create value for mutual benefit and create a win-win situation. Welcome customers all over the world to contact us or visit our company. We are going to satisfy you with our expert service!

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  • Glassy Carbon Coated Graphite Crucible

    Glassy Carbon Coated Graphite Crucible

    Customized Glassy Carbon Coated Graphite Crucible is a high-end product for E-beam Guns, silicon single crystal pulling, epitaxy.Through years of technical accumulation,Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance. It offers enhanced durability against scratching and other friction, also reduces the generation of dust. Welcome to visit our factory for more information.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.
  • Pre-Heat Ring

    Pre-Heat Ring

    Pre-heat ring is used in the semiconductor epitaxy process to preheat wafers and make the temperature of wafers more stable and uniform, which is of great significance for the high-quality growth of epitaxy layers. Vetek Semiconductor strictly controls the purity of this product to prevent volatilization of impurities at high temperatures.Welcome to have a further discussion with us.
  • Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head

    Solid SiC Gas Shower Head plays a major role in making the gas uniform in the CVD process, thereby ensuring uniform heating of the substrate. VeTek Semiconductor has been deeply involved in the field of solid SiC devices for many years and is able to provide customers with customized Solid SiC Gas Shower Heads. No matter what your requirements are, we look forward to your inquiry.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • High Purity Porous Graphite

    High Purity Porous Graphite

    High Purity Porous Graphite provided by VeTek Semiconductor is an advanced semiconductor processing material. It is made of high-purity carbon material with excellent thermal conductivity, good chemical stability and excellent mechanical strength. This High Purity Porous Graphite plays an important role in the growth process of single crystal SiC. VeTek Semiconductor is committed to providing quality products at competitive prices and looks forward to becoming your long-term partner in China.Welcome to consult at any time.

  • What is SiC Ceramic?

    SiC ceramic is a ceramic material produced by the reaction of silicon (Si) and carbon (C) elements, featuring extremely high hardness, heat resistance and chemical stability

  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

  • How much do you know about CVD SiC ? - VeTek Semiconductor

    CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • What is CMP Polishing Slurry Preparation Process

    In semiconductor manufacturing, Chemical Mechanical Planarization (CMP) plays a vital role. The CMP process combines chemical and mechanical actions to smooth the surface of silicon wafers, providing a uniform foundation for subsequent steps such as thin-film deposition and etching. CMP polishing slurry, as the core component of this process, significantly impacts polishing efficiency, surface quality, and the final performance of the product

  • ALD Atomic Layer Deposition Recipe

    Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

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