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China SiC Paddle for Semiconductor Manufacturer, Supplier, Factory

We believe in: Innovation is our soul and spirit. Excellent is our life. Buyer want is our God for SiC Paddle for Semiconductor, SiC Cantilever Paddle, Silicon Carbide Cantilever Paddle, High Temperature SiC Paddle, SiC Cantilever Wafer Handling, High-quality is factory's everyday living , Focus on customers' demand would be the source of organization survival and advancement, We adhere to honesty and good faith doing the job attitude, seeking forward towards your coming !
SiC Paddle for Semiconductor, For many years, we have now adhered to the principle of customer oriented, quality based, excellence pursuing, mutual benefit sharing. We hope, with great sincerity and good will, to have the honor to help with your further market.

Hot Products

  • 8 Inch Halfmoon Part for LPE Reactor

    8 Inch Halfmoon Part for LPE Reactor

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China, focusing on the R&D and production of 8 Inch Halfmoon Part for LPE Reactor. We have accumulated rich experience over the years, especially in SiC coating materials, and are committed to providing efficient solutions tailored for LPE epitaxial reactors. Our 8 Inch Halfmoon Part for LPE Reactor has excellent performance and compatibility, and is an indispensable key component in epitaxial manufacturing. Welcome your inquiry to learn more about our products.
  • TaC Coating Ring

    TaC Coating Ring

    TaC Coating Ring is a high-performance component designed for use in semiconductor processes, VeTek semiconductor TaC Coating Ring has high thermal stability, resistance to chemical corrosion, and excellent mechanical strength and is specifically used to hold and support SiC wafers during the etching process, where precise control and durability are essential for achieving high-quality wafers. we are looking forward to your further consultation.
  • Aixtron G10 Solid SiC planetary reactor components

    Aixtron G10 Solid SiC planetary reactor components

    VeTek Semiconductor’s Solid SiC accessories for the Aixtron G10-SiC platform are high-purity, fully dense silicon carbide components designed for the demanding thermal and chemical environment of SiC epitaxial growth. These parts deliver outstanding high-temperature stability, chemical resistance, and ultra-low particle generation, supporting the high-throughput 9×150 mm / 6×200 mm planetary reactor configuration used in power device manufacturing.
  • Silicon Carbide Epitaxy Wafer Carrier

    Silicon Carbide Epitaxy Wafer Carrier

    VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.Welcome to consult at any time.
  • CVD SiC Graphite Cylinder

    CVD SiC Graphite Cylinder

    Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.

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