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China SiC Epitaxy Process Manufacturer, Supplier, Factory

We'll make each hard work to become excellent and excellent, and speed up our measures for standing from the rank of intercontinental top-grade and high-tech enterprises for SiC Epitaxy Process, TaC Coating Crucible, CVD TaC Coating Crucible, TaC Coating Crucible Supplier, High pure graphite crucible, Welcome any inquiry to our firm. We're going to be glad to establish pleasant business interactions with you!
SiC Epitaxy Process, There are advanced producing & processing equipment and skilled workers to ensure the merchandise with high quality. We now have found an excellent before-sale, sale, after-sale service to ensure the customers that could rest assured to make orders. Until now our goods are now moving on fast and very popular in South America, East Asia, the Middle east, Africa, etc.

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  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • CVD TaC coated three-petal guide ring

    CVD TaC coated three-petal guide ring

    VeTek Semiconductor has experienced many years of technological development and has mastered the leading process technology of CVD TaC coating. CVD TaC coated three-petal guide ring is one of VeTek Semiconductor's most mature CVD TaC coating products and is an important component for preparing SiC crystals by PVT method. With the help of VeTek Semiconductor, I believe your SiC crystal production will be smoother and more efficient.
  • Silicon Carbide Seal Ring

    Silicon Carbide Seal Ring

    As a professional Silicon Carbide Seal Ring product manufacturer and factory in China, VeTek Semiconductor Silicon Carbide Seal Ring is widely used in semiconductor processing equipment due to its excellent heat resistance, corrosion resistance, mechanical strength and thermal conductivity. It is especially suitable for processes involving high temperature and reactive gases such as CVD, PVD and plasma etching, and is a key material choice in the semiconductor manufacturing process. Your further inquiries are welcome.
  • SiC Coated Pedestal

    SiC Coated Pedestal

    Vetek Semiconductor is professional in fabricating CVD SiC coating, TaC coating on graphite and silicon carbide material. We provide OEM and ODM products like SiC Coated Pedestal,wafer carrier, wafer chuck, wafer carrier tray, planetary disk and so on.With 1000 grade clean room and purification device,we can provide you products with impurity below 5ppm.Looking forward to hearing from you soon.
  • TaC Coating Guide Ring

    TaC Coating Guide Ring

    VeTek Semiconductor's TaC Coating Guide Ring is created by applying tantalum carbide coating onto graphite parts using a highly advanced technique called chemical vapor deposition (CVD). This method is well-established and offers exceptional coating properties. By utilizing the TaC Coating Guide Ring, the lifespan of graphite components can be significantly extended, the movement of graphite impurities can be suppressed, and the SiC and AIN single crystal quality can be reliably maintained. Welcome to inquiry us.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!

  • How Can a Glassy Carbon Coated Graphite Crucible Improve High-Temperature Semiconductor Material Processing

    A Glassy Carbon Coated Graphite Crucible is an advanced thermal processing component designed for demanding applications such as semiconductor manufacturing, crystal growth, vacuum heat treatment, and high-temperature material research. This article explains its structure, advantages, applications, and selection considerations. VeTek Semiconductor provides high-performance crucible solutions that combine glassy carbon coating technology with precision graphite manufacturing to meet the strict requirements of modern industries.

  • What is step-controlled epitaxial growth？

  • What’s the specific application of TaC coated parts in the semiconductor field?

    Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

  • Veteksemicon shines at the 2025 Shanghai SEMICON International Exhibition

    Veteksemicon shines at 2025 Shanghai SEMICON International Exhibition, leading the future of semiconductor industry with innovative technologies

  • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

    This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

  • Why Is Graphite Coated with Silicon Carbide for Semiconductor Epitaxy?

    SiC-coated graphite combines the machinability and thermal behavior of high-purity graphite with a chemically stable CVD silicon carbide process surface. This technical white paper explains why bare graphite can become a source of chemical interaction, impurities and particles in epitaxy reactors, how CVD SiC creates a more stable process boundary, and why coating integrity, substrate compatibility, geometry and thermal behavior must be engineered together. It also examines the different demands of silicon and SiC epitaxy and outlines how coated susceptors should be specified for semiconductor applications.

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LPE SiC epitaxy processSiC epitaxy processes

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