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Every single member from our large efficiency profits team values customers' requirements and organization communication for SiC epitaxial layer, CVD TaC coating planetary SiC epitaxial susceptor, SiC epitaxial susceptor, CVD TaC coating, SiC planetary epitaxial susceptor, In addition, we would properly guideline the shoppers about the application techniques to adopt our products and solutions as well as the way to select appropriate materials.
SiC epitaxial layer, Our solutions are widely recognized and trusted by users and can meet continuously changing of economic and social needs. We welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

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  • 7N High-Purity CVD SiC raw material

    7N High-Purity CVD SiC raw material

    The quality of the initial source material is the primary factor limiting wafer yield in the production of SiC single crystals. VETEK's 7N High-Purity CVD SiC Bulk offers a high-density polycrystalline alternative to traditional powders, specifically engineered for Physical Vapor Transport (PVT). By utilizing a bulk CVD form, we eliminate common growth defects and significantly improve furnace throughput. Looking forward to your inquiry.
  • silicon carbide ceramic coating graphite heater

    silicon carbide ceramic coating graphite heater

    VeTek semiconductor's Silicon Carbide Ceramic Coating Graphite Heater is a high-performance heater made of graphite substrate and coated with silicon carbon ceramic (SiC) coating on its surface. With its composite material design, this product provides excellent heating solutions in semiconductor manufacturing. Welcome your inquiry.
  • TaC Coating Rotation Susceptor

    TaC Coating Rotation Susceptor

    As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
  • SiC Coated Wafer Carrier for Etching

    SiC Coated Wafer Carrier for Etching

    As a leading Chinese manufacturer and supplier of Silicon Carbide Coating products, Veteksemicon's SiC Coated Wafer Carrier for Etching plays an irreplaceable core role in the etching process with its excellent high temperature stability, outstanding corrosion resistance and high thermal conductivity.
  • Graphite Rotating Susceptor

    Graphite Rotating Susceptor

    High purity graphite rotating susceptor plays an important role in the epitaxial growth of gallium nitride (MOCVD process). VeTek Semiconductor is a leading graphite rotating susceptor manufacturer and supplier in China. We have developed many high-purity graphite products based on high-purity graphite materials, which fully meet the requirements of the semiconductor industry. VeTek Semiconductor looks forward to becoming your partner in Rotating Graphite susceptor.
  • CVD SiC Focus Ring

    CVD SiC Focus Ring

    VeTek Semiconductor is a leading domestic manufacturer and supplier of CVD SiC focus rings, dedicated to providing high-performance, high-reliability product solutions for the semiconductor industry. VeTek Semiconductor's CVD SiC focus rings use advanced chemical vapor deposition (CVD) technology, have excellent high temperature resistance, corrosion resistance and thermal conductivity, and are widely used in semiconductor lithography processes. Your inquiries are always welcome.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is Wafer CMP Polishing Slurry?

    Wafer CMP polishing slurry is a specially formulated liquid material used in the CMP process of semiconductor manufacturing. It consists of water, chemical etchants, abrasives, and surfactants, enabling both chemical etching and mechanical polishing.

  • Application of carbon-based thermal field materials in silicon carbide crystal growth

    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

  • Why does SiC coating receive so much attention? - VeTek Semiconductor

    SiC has high hardness, thermal conductivity, and corrosion resistance, making it ideal for semiconductor manufacturing. CVD SiC coating is created through chemical vapor deposition, providing high thermal conductivity, chemical stability, and a matching lattice constant for epitaxial growth. Its low thermal expansion and high hardness ensure durability and precision, making it essential in applications like wafer carriers, preheating rings, and more. VeTek Semiconductor specializes in custom SiC coatings for diverse industry needs.

  • The Development History of 3C SiC

    Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

  • What are the differences between Isotropic Graphite and Siliconized Graphite?

    Graphite materials have a wide range of application scenarios. Among them, Isotropic Graphite and Siliconized Graphite are the two main different types of graphite materials, and their characteristics, application scenarios and advantages are significantly different. This blog will conduct a comparative analysis from three aspects: structural characteristics, application scenarios and product advantages.

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