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China PVT SiC Growth Parts Manufacturer, Supplier, Factory

We take pleasure in an extremely fantastic standing among the our prospects for our great product top quality, competitive cost and the finest support for PVT SiC Growth Parts, Porous TaC Coated Graphite Ring, CVD TaC Coated Graphite Ring, Tantalum Carbide Coating, TaC Coated Graphite Component, We generally offer most effective top quality merchandise and great assistance for the majority of enterprise users and traders . Warmly welcome to affix us, let's innovate together, and fly dreams.
PVT SiC Growth Parts, What You Need Is What We Pursue.We are sure our products will bring you first class quality.And now sincerely hope to promote partner friendship with you from all over the world. Let's joint hands to cooperate with mutual benefits!

Hot Products

  • Three-petal Graphite Crucible

    Three-petal Graphite Crucible

    VeTek Semiconductor's Three-petal Graphite Crucible is made of high purity graphite material processed by surface pyrolytic carbon coating, which is used to pull single crystal thermal field. Compared with traditional crucible, the structure of three-lobe design is more convenient to install and disassemble, improve work efficiency, and the impurities below 5ppm can meet the application of semiconductor and photovoltaic industry.
  • Tantalum Carbide Coated Tube for Crystal Growth

    Tantalum Carbide Coated Tube for Crystal Growth

    Tantalum Carbide Coated Tube for Crystal Growth is mainly used in SiC crystal growth process. VeTek Semiconductor has been supplying Tantalum Carbide Coated Tube for Crystal Growth for many years and has been working in the field of TaC coating for many years. Our products have a high purity and high temperature resistance. We look forward to becoming your long-term partner in China. Feel free to inquire us.
  • Wafer Carrier Tray

    Wafer Carrier Tray

    Vetek Semiconductor specializes in partnering with its customers to produce custom designs for Wafer Carrier Tray. Wafer Carrier tray can be designed for use in CVD silicon epitaxy, III-V epitaxy, and III-Nitride epitaxy, Silicon carbide epitaxy. Please contact Vetek semiconductor regarding your susceptor requirements.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • SiC Coated Planetary Susceptor

    SiC Coated Planetary Susceptor

    Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.
  • CVD SiC Graphite Cylinder

    CVD SiC Graphite Cylinder

    Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.

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