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China porous graphite Component Manufacturer, Supplier, Factory

We hold strengthening and perfecting our items and repair. At the same time, we get the job done actively to do research and progress for porous graphite Component, Porous Graphite, Porous Graphite Crucible, Graphite Crucible, SiC Coated Graphite Barrel Susceptor, We welcome new and aged buyers from all walks of lifetime to make contact with us for potential small business associations and mutual success!
porous graphite Component, We adopt advanced production equipment and technology, and perfect testing equipment and methods to ensure our product quality. With our high-level talents, scientific management, excellent teams, and attentive service, our goods are favored by domestic and foreign customers. With your support, we are going to build a better tomorrow!

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    VeTek Semiconductor's Three-petal Graphite Crucible is made of high purity graphite material processed by surface pyrolytic carbon coating, which is used to pull single crystal thermal field. Compared with traditional crucible, the structure of three-lobe design is more convenient to install and disassemble, improve work efficiency, and the impurities below 5ppm can meet the application of semiconductor and photovoltaic industry.
  • CVD SiC coating Heating Element

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    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • Epi wafer holder

    Epi wafer holder

    VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
  • SiC Coated Graphite Barrel Susceptor

    SiC Coated Graphite Barrel Susceptor

    VeTek Semiconductor SiC Coated Graphite Barrel Susceptor is a high-performance wafer tray designed for semiconductor epitaxy processes, offering excellent thermal conductivity, high-temperature and chemical resistance, a high-purity surface, and customizable options to enhance production efficiency. Welcome your further inquiry.
  • High purity graphite soft felt

    High purity graphite soft felt

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  • CVD SiC coating Dummy wafer

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  • Three SiC single crystal growth technologies

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  • What is SiC-coated graphite susceptor ?

    This blog takes "What is SiC-coated graphite susceptor?" as its theme, and discusses it from the perspectives of Epitaxial layer and its equipment, Importance of SiC coated graphite susceptor in CVD equipment, SiC Coating technology, Market competition and Vetek Semiconductor’s technological innovation.

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    The article analyzes the specific challenges faced by the CVD TaC coating process for SiC single crystal growth during semiconductor processing, such as material source and purity control, process parameter optimization, coating adhesion, equipment maintenance and process stability, environmental protection and cost control, as well as the corresponding industry solutions.

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  • What is High-purity porous graphite?

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  • How Porous Graphite Enhances Silicon Carbide Crystal Growth?

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