Web Menu

Product Search

Language

Products

China porous graphite Component Manufacturer, Supplier, Factory

We hold strengthening and perfecting our items and repair. At the same time, we get the job done actively to do research and progress for porous graphite Component, Porous Graphite, Porous Graphite Crucible, Graphite Crucible, SiC Coated Graphite Barrel Susceptor, We welcome new and aged buyers from all walks of lifetime to make contact with us for potential small business associations and mutual success!
porous graphite Component, We adopt advanced production equipment and technology, and perfect testing equipment and methods to ensure our product quality. With our high-level talents, scientific management, excellent teams, and attentive service, our goods are favored by domestic and foreign customers. With your support, we are going to build a better tomorrow!

Related Products

Hot Products

  • Contiguous Wafer Boat

    Contiguous Wafer Boat

    Vetek Semiconductor Contiguous Wafer Boat is an advanced equipment for semiconductor processing. The product structure is carefully designed to ensure efficient processing and production of precision wafers. VeTekSemi supports customized product solutions and looks forward to your consultation.
  • Si EPI Susceptor

    Si EPI Susceptor

    China top factory-Vetek Semiconductor combines precision machining and semiconductor SiC and TaC coating capabilities. The barrel type Si Epi Susceptor provides temperature and atmosphere control capabilities, enhancing production efficiency in semiconductor epitaxial growth processes.Looking forward to setting up cooperation relationship with you.
  • Silicon Carbide Wafer Chuck

    Silicon Carbide Wafer Chuck

    As a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Welcome your further consultation.
  • MOCVD Susceptor with TaC Coating

    MOCVD Susceptor with TaC Coating

    VeTek Semiconductor is a comprehensive supplier involved in the research, development, production, design, and sales of TaC coatings and SiC coating parts. Our expertise lies in the production of state-of-the-art MOCVD Susceptor with TaC Coating, which play a vital role in the LED epitaxy process. We welcome you to discuss with us inquiries and further information.
  • SiC Crystal Growth Porous Graphite

    SiC Crystal Growth Porous Graphite

    As a China leading SiC Crystal Growth Porous Graphite manufacturer , VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite's investment and R&D, our Porous Graphite products have won high praise from European and American customers. Looking forward to your contact.
  • CVD SiC Coated Graphite Shower Head

    CVD SiC Coated Graphite Shower Head

    The CVD SiC Coated Graphite Shower Head from Veteksemicon is a high-performance component specifically designed for semiconductor chemical vapor deposition (CVD) processes. Manufactured from high-purity graphite and protected with a chemical vapor deposition (CVD) silicon carbide (SiC) coating, this shower head delivers outstanding durability, thermal stability, and resistance to corrosive process gases. Looking forward to your further consultation.

  • Porous Silicon Carbide (SiC) Ceramic Plates: High-Performance Materials in Semiconductor Manufacturing

    Porous SiC Ceramic Plate is one of the core materials in the field of semiconductor manufacturing. With its unique structure and excellent physical properties, Porous SiC Ceramic Disc has become an irreplaceable key component in high temperature and corrosive environments. In this article, we will deeply analyze its physical properties, application scenarios and selection advantages.

  • What is SiC-coated graphite susceptor ?

    This blog takes "What is SiC-coated graphite susceptor?" as its theme, and discusses it from the perspectives of Epitaxial layer and its equipment, Importance of SiC coated graphite susceptor in CVD equipment, SiC Coating technology, Market competition and Vetek Semiconductor’s technological innovation.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • Can Isotropic Graphite Withstand Extreme Heat in High-Temperature Furnaces

    At VETEK, we’ve spent decades refining our isotropic graphite solutions for industries that demand reliability at soaring temperatures. Let’s dive into why this material is a top choice—and how our products outperform the competition.

  • Italy's LPE's 200mm SiC epitaxial technology progress

    This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept