Products

China LPE Vertical Susceptor Wafer Manufacturer, Supplier, Factory

Our pursuit and company goal is to "Always satisfy our customer requirements". We continue to develop and design superior quality products for both our old and new customers and achieve a win-win prospect for our clients as well as us for LPE Vertical Susceptor Wafer, SiC Coated Barrel Susceptor, CVD SiC coating barrel type susceptor, CVD SiC coating barrel susceptor, SiC Coated Graphite Barrel Susceptor for EPI, Never-ending improvement and striving for 0% deficiency are our two main good quality policies. Should you need anything, do not hesitate to call us.
LPE Vertical Susceptor Wafer, We look forward to hearing from you, whether you are a returning customer or a new one. We hope you will find what you are looking for here, if not, please contact us immediately. We pride ourselves on top notch customer service and response. Thank you for your business and support!

Hot Products

  • Solid SiC Disc-shaped Shower Head

    Solid SiC Disc-shaped Shower Head

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China and a professional manufacturer and supplier of Solid SiC Disc-shaped Shower Head. Our Disc shape Shower Head is widely used in thin film deposition production such as CVD process to ensure uniform distribution of reaction gas and is one of the core components of CVD furnace.
  • Tantalum Carbide Coated Planetary Rotation Disk

    Tantalum Carbide Coated Planetary Rotation Disk

    VeTek Semiconductor is a leading manufacturer and supplier of Tantalum Carbide Coated Planetary Rotation Disk in China, focusing on TaC coating technology for many years. Our products have high purity and excellent high temperature resistance, which are widely recognized by semiconductor manufacturers. VeTek Semiconductor Tantalum Carbide Coated Planetary Rotation Disk has become the backbone of the wafer epitaxy industry. We look forward to establishing a long-term partnership with you to jointly promote technological progress and production optimization.
  • SiC coating ALD susceptor

    SiC coating ALD susceptor

    The SiC coating ALD susceptor is a support component specifically used in the atomic layer deposition (ALD) process. It plays a key role in the ALD equipment, ensuring the uniformity and precision of the deposition process. We believe that our ALD Planetary Susceptor products can bring you high-quality product solutions.
  • TaC Coated Ring for SiC Epitaxial Reactor

    TaC Coated Ring for SiC Epitaxial Reactor

    VeTek Semiconductor is a leading manufacturer and technology innovator of TaC Coated Ring for SiC Epitaxial Reactor in China, focusing on providing high-performance solutions for SiC epitaxial reactors. We have many years of experience in TaC coating technology. TaC Coated Ring has the characteristics of high purity, high stability, excellent corrosion resistance, etc., and can provide long-term stable performance in the harsh working environment of epitaxial reactors. We look forward to establishing a long-term strategic partnership with you.
  • Tantalum Carbide Coated Guide Ring

    Tantalum Carbide Coated Guide Ring

    As a China leading TaC coating guide ring supplier and manufacturer, VeTek Semiconductor tantalum carbide coated guide ring is an important component used to guide and optimize the flow of reactive gases in the PVT (Physical Vapor Transport) method. It promotes the uniform deposition of SiC single crystals in the growth zone by adjusting the distribution and speed of the gas flow. VeTek Semiconductor is a leading manufacturer and supplier of TaC coating guide rings in China and even in the world, and we look forward to your consultation.
  • Silicon Carbide Robot Arm

    Silicon Carbide Robot Arm

    Our silicon carbide (SiC) robotic arm is designed for high-performance wafer handling in advanced semiconductor manufacturing. Made of high-purity silicon carbide, this robotic arm offers exceptional resistance to high temperatures, plasma corrosion, and chemical attack, ensuring reliable operation in demanding cleanroom environments. Its exceptional mechanical strength and dimensional stability enable precise wafer handling while minimizing contamination risks, making it an ideal choice for MOCVD, epitaxy, ion implantation, and other critical wafer handling applications. We welcome your inquiries.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies.Privacy Policy
RejectAccept