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China tip pin Manufacturer, Supplier, Factory

Our company puts emphasis about the administration, the introduction of talented staff, along with the construction of employees building, seeking hard to boost the standard and liability consciousness of staff members members. Our business successfully attained IS9001 Certification and European CE Certification of tip pin, SiC coated wafer lift pin, wafer lift pin, SiC coating, Epi process, We are going to wholeheartedly welcome all clientele during the industry both of those at your home and overseas to cooperate hand in hand, and build a bright potential together.
tip pin, We always stick to the tenet of "sincerity, high quality, high efficiency, innovation". With years of efforts, we have established friendly and stable business relationships with worldwide customers. We welcome any of your inquiries and concerns for our merchandise, and we have been sure that we'll supply just what you want, as we always believe that your satisfaction is our success.

Hot Products

  • ALD Fused Quartz Pedestal

    ALD Fused Quartz Pedestal

    As a professional ALD Fused Quartz Pedestal products manufacturer and supplier in China, VeTek Semiconductor ALD Fused Quartz Pedestal is specifically designed for use in Atomic Layer Deposition (ALD), Low-Pressure Chemical Vapor Deposition (LPCVD) as well as diffusion wafer process, ensuring uniform deposition of thin films on wafer surfaces. Welcome to your further inquiries.
  • Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig

    Pull Silicon Single Crystal Jig is designed to ensure the purity of wafers and precise control of hot zones during crystallization, offering sustainable and efficient solutions for the photovoltaic industry.Veteksemicon is looking forward to setting long-term cooperation with you.
  • Large sized resistance heating SiC crystal growth furnace

    Large sized resistance heating SiC crystal growth furnace

    Silicon carbide crystal growth is a core process in the manufacturing of high-performance semiconductor devices. The stability, precision, and compatibility of crystal growth equipment directly determine the quality and yield of silicon carbide ingots. Based on the characteristics of Physical Vapor Transport (PVT) technology, Veteksemi has developed a resistance heating furnace for silicon carbide crystal growth, enabling stable growth of 6-inch, 8-inch, and 12-inch silicon carbide crystals with full compatibility with conductive, semi-insulating, and N-type material systems. Through precise control of temperature, pressure, and power, it effectively reduces crystal defects such as EPD (Etch Pit Density) and BPD (Basal Plane Dislocation), while featuring low energy consumption and a compact design to meet the high standards of industrial large-scale production.
  • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported SGL graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.
  • SiC Coated Top Plate for LPE PE2061S

    SiC Coated Top Plate for LPE PE2061S

    VeTek Semiconductor has been deeply engaged in SiC coating products for many years and has become a leading manufacturer and supplier of SiC Coated Top Plate for LPE PE2061S in China. The SiC Coated Top Plate for LPE PE2061S we provide is designed for LPE silicon epitaxial reactors and is located on the top together with the barrel base. This SiC Coated Top Plate for LPE PE2061S has excellent characteristics such as high purity, excellent thermal stability and uniformity, which helps to grow high-quality epitaxial layers. No matter what product you need, we look forward to your inquiry.

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