Web Menu

Product Search

Language

Products

China single crystal pulling Manufacturer, Supplier, Factory

Dedicated to strict high-quality management and considerate shopper company, our experienced team associates are normally available to discuss your requirements and ensure full shopper gratification for single crystal pulling, Fused Opaque Quartz, Quartz crucible, Electric Fused Quartz, Semiconductor quartz boat, Our merchandise delight in excellent popularity among our buyers. We welcome consumers, business enterprise associations and good friends from all components with the globe to make contact with us and seek out cooperation for mutual rewards.
single crystal pulling, By integrating manufacturing with foreign trade sectors, we can provide total customer solutions by guaranteeing the delivery of right products to the right place at the right time, which is supported by our abundant experiences, powerful production capability, consistent quality, diversified products and the control of the industry trend as well as our maturity before and after sales services. We'd like to share our ideas with you and welcome your comments and questions.

Related Products

Hot Products

  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • EPI susceptor

    EPI susceptor

    The EPI susceptor is designed for the demanding epitaxial equipment applications. Its high-purity silicon carbide (SiC) coated graphite structure offers excellent heat resistance, uniform thermal uniformity for consistent epitaxial layer thickness and resistance, and long-lasting chemical resistance. We look forward to cooperating with you.
  • SiC Coating Collector Top

    SiC Coating Collector Top

    Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
  • Wafer Lift Pin

    Wafer Lift Pin

    VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.
  • VEECO MOCVD Susceptor

    VEECO MOCVD Susceptor

    As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
  • Three-petal Graphite Crucible

    Three-petal Graphite Crucible

    VeTek Semiconductor's Three-petal Graphite Crucible is made of high purity graphite material processed by surface pyrolytic carbon coating, which is used to pull single crystal thermal field. Compared with traditional crucible, the structure of three-lobe design is more convenient to install and disassemble, improve work efficiency, and the impurities below 5ppm can meet the application of semiconductor and photovoltaic industry.

  • What is an Electrostatic Chuck (ESC)?

    In the high-stakes world of semiconductor fabrication, precision and stability are everything—and that's where the Electrostatic Chuck (ESC) steps in. Far more than just a holding tool, the ESC uses electrostatic forces to securely clamp wafers during critical processes like etching, deposition, and ion implantation. But how does it actually work? Why is it superior to traditional mechanical clamping? And what role does it play in achieving nanoscale accuracy and throughput efficiency? Welcome to read.

  • What Exactly is the Third Generation Semiconductor?

    When you see the third-generation semiconductors, you will surely wonder what the first and second generations were. The "generation" here is classified based on the materials used in semiconductor manufacturing.

  • What is an Electrostatic Chuck (ESC)?

    The electrostatic chuck(ESC), also known as the electrostatic chuck (ESC, e-chuck), is a fixture that uses the principle of electrostatic adsorption to hold and fix the adsorbed material. It is suitable for vacuum and plasma environments.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

    As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

Related Search

Parts for silicon single crystal pulling devices

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept