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China MOCVD System Manufacturer, Supplier, Factory

We are commitment to offer the competitive price ,outstanding products quality, as well as fast delivery for MOCVD System, Sapphire Substrate for LED, MOCVD Epitaxy system, Aixtron Equipment, Veeco Equipment, With our rules of " small business track record, partner trust and mutual benefit", welcome all of you to definitely work together , expand with each other.
MOCVD System, We care about every steps of our services, from factory selection, product development & design, price negotiation, inspection, shipping to aftermarket. Now we have implemented a strict and complete quality control system, which ensures that each product can meet quality requirements of customers. Besides, all of our solutions have been strictly inspected before shipment. Your Success, Our Glory: Our aim is to help customers realize their goals. We're making great efforts to achieve this win-win situation and sincerely welcome you to join us.

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  • SiC Coating Cover Segments

    SiC Coating Cover Segments

    Vtech Semiconductor is committed to the development and commercialization of CVD SiC coated parts for Aixtron reactors. As an example, our SiC Coating Cover Segments have been carefully processed to produce a dense CVD SiC coating with excellent corrosion resistance, chemical stability, welcome to discuss application scenarios with us.
  • CVD Tantalum Carbide(TaC) Coated Susceptor

    CVD Tantalum Carbide(TaC) Coated Susceptor

    The VETEK CVD TaC Coated Susceptor combines a high-purity isostatic graphite substrate with a dense CVD tantalum carbide (TaC) coating to deliver exceptional thermal stability, corrosion resistance, and low particle generation for demanding semiconductor epitaxy. Designed for SiC, GaN, and AlN epitaxial growth, it minimizes contamination, improves wafer temperature uniformity, and extends component service life in high-temperature MOCVD and CVD processes.
  • CVD SiC Coated Barrel Susceptor

    CVD SiC Coated Barrel Susceptor

    VeTek Semiconductor is a leading manufacturer and innovator of CVD SiC Coated graphite Susceptor in China. Our CVD SiC Coated Barrel Susceptor plays a key role in promoting the epitaxial growth of semiconductor materials on wafers with its excellent product characteristics. Welcome to your further consultation.
  • Fused Opaque Quartz

    Fused Opaque Quartz

    As a VeTek Semiconductor's fused opaque quartz features low transmittance and high thermal reflectivity, which can significantly reduce heat loss and thereby extend the life of heating components. Ultra-long service life, suitable for semiconductor heat treatment processes. VeTek Semiconductor is a professional supplier and manufacturer of fused opaque quartz and looks forward to becoming your long-term partner.
  • SiC Edge Ring

    SiC Edge Ring

    Veteksemicon High-purity SiC edge rings, specially designed for semiconductor etching equipment, feature outstanding corrosion resistance and thermal stability, significantly enhancing wafer yield
  • CVD SiC Coated RTP Susceptor

    CVD SiC Coated RTP Susceptor

    The CVD SiC coated RTP susceptor from VeTek Semiconductor serves rapid thermal processing (RTP) and rapid thermal annealing (RTA) equipment used throughout semiconductor manufacturing. The substrate is machined from high‑purity isostatic graphite, over which a dense CVD silicon carbide (SiC) layer is deposited. This construction yields high thermal conductivity, robust chemical inertness, and sustained dimensional stability under repeated high‑temperature cycling.
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  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

  • Welcome Customers to Visit Veteksemicon's Carbon Fiber Products Factory

    On September 5, 2025, a customer from Poland visited a factory under VETEK to learn about our advanced technologies and innovative processes in the production of carbon fiber products.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

  • Why Is a Tantalum Carbide Coating Ring Essential for High-Performance Semiconductor Manufacturing

    As semiconductor manufacturing continues to evolve toward higher precision, purity, and thermal stability, advanced coating materials have become critical components in process equipment. Among them, the Tantalum Carbide Coating Ring stands out for its exceptional resistance to high temperatures, corrosion, plasma erosion, and particle contamination.

  • Research on SIC Wafer Carrier Technology

    ​SiC wafer carriers, as key consumables in the third-generation semiconductor industry chain, their technical characteristics directly affect the yield of epitaxial growth and device manufacturing. With the surging demand for high-voltage and high-temperature devices in industries such as 5G base stations and new energy vehicles, the research and application of SiC wafer carriers are now facing significant development opportunities.

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