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China SiC Substrates Manufacturer, Supplier, Factory

No matter new shopper or old customer, We believe in very long expression and dependable relationship for SiC Substrates, Epitaxy systems, TSl systems, SiC Epitaxy, CVD SiC coated Halfmoon, We sincerely stay up for hearing from you. Give us a chance to show you our professionalism and passion. We've been sincerely welcome superior mates from numerous circles at dwelling and overseas come to cooperate!
SiC Substrates, Our goods are produced with the best raw materials. Every moment, we constantly improve the production programme. In order to ensure better quality and service, we have been focusing on the production process. We have now got high praise by partner. We're looking forward to establishing business relationship with you.

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  • High purity rigid felt

    High purity rigid felt

    VeTek Semiconductor is one of the leading manufacturers and suppliers of High purity rigid felt. High purity rigid felt is mainly used for the heat preservation of the half-moon parts in SiC epitaxial growth, and is the core component to ensure the uniform growth of SiC epitaxy. VeTek Semiconductor is always committed to providing you with the right High purity rigid felt and tailoring the best solution for you.
  • Aluminum Nitride ceramic Disc

    Aluminum Nitride ceramic Disc

    Vetek Semiconductor aluminum nitride ceramics disc is a high-performance material known for its excellent properties of high thermal conductivity & electrical insulation, especially suitable for demanding electrical applications. Aluminum nitride ceramic discs are stable at high temperatures in a variety of inert environments. Welcome to communicate with us.
  • CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor is one of the core components of MOCVD planetary reactor. Through CVD TaC coating planetary SiC epitaxial susceptor, the large disk orbits and the small disk rotates, and the horizontal flow model is extended to multi-chip machines, so that it has both the high-quality epitaxial wavelength uniformity management and defect optimization of single-chip machines and the production cost advantages of multi-chip machines.VeTek Semiconductor can provide customers with highly customized CVD TaC coating planetary SiC epitaxial susceptor. If you also want to make a planetary MOCVD furnace like Aixtron, come to us!
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • Glassy Carbon Coated Graphite Crucible

    Glassy Carbon Coated Graphite Crucible

    Customized Glassy Carbon Coated Graphite Crucible is a high-end product for E-beam Guns, silicon single crystal pulling, epitaxy.Through years of technical accumulation,Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance. It offers enhanced durability against scratching and other friction, also reduces the generation of dust. Welcome to visit our factory for more information.
  • SiC Coated Graphite Barrel Susceptor

    SiC Coated Graphite Barrel Susceptor

    VeTek Semiconductor SiC Coated Graphite Barrel Susceptor is a high-performance wafer tray designed for semiconductor epitaxy processes, offering excellent thermal conductivity, high-temperature and chemical resistance, a high-purity surface, and customizable options to enhance production efficiency. Welcome your further inquiry.

  • 8-inch SiC epitaxial furnace and homoepitaxial process research

    8-inch SiC epitaxial furnace and homoepitaxial process research

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • How to choose MOCVD graphite tray?

    MOCVD graphite trays play an important role in the epitaxial process. This article makes a detailed analysis on the selection of MOCVD graphite trays from the perspectives of material properties and application scenarios.

  • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

    Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

  • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

    Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

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