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China Compound Semiconductor Crystals Manufacturer, Supplier, Factory

We always continually provide you with the most conscientious customer service, and the widest variety of designs and styles with finest materials. These efforts include the availability of customized designs with speed and dispatch for Compound Semiconductor Crystals, TaC Coated Nozzles, TaC Coated Heat Shields, Halfmoon Parts with TaC Coated, TaC Coated Crucible, We'll do our greatest to fulfill your specifications and are sincerely searching ahead to developing mutual helpful small business marriage with you!
Compound Semiconductor Crystals, Our domestic website's generated over 50, 000 purchasing orders every year and quite successful for internet shopping in Japan. We would be happy to have an opportunity to do business with your company. Looking forward to receiving your message !

Hot Products

  • CVD TaC Coating Cover

    CVD TaC Coating Cover

    CVD TaC coating cover provided by VeTek Semiconductor is a highly specialized component designed specifically for demanding applications. With its advanced features and exceptional performance, our CVD TaC coating cover offers several key advantages.Our CVD TaC coating cover provides the necessary protection and performance required for success.We looking forward to exploring potential cooperation with you!
  • Quartz Furnace Tube for Diffusion Furnace

    Quartz Furnace Tube for Diffusion Furnace

    VeTek Semiconductor’s high-purity quartz furnace tubes are core process chamber components for semiconductor thermal processing equipment. Manufactured from semiconductor-grade dehydroxylated fused quartz, these tubes serve as the sealed reaction cavity in oxidation furnaces, diffusion furnaces, annealing furnaces, and LPCVD systems. They deliver exceptional purity, thermal stability, and chemical resistance, ensuring uniform temperature fields, stable gas flow, and ultra-low contamination for 4/6/8/12-inch wafer processing.
  • 8 Inch Halfmoon Part for LPE Reactor

    8 Inch Halfmoon Part for LPE Reactor

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China, focusing on the R&D and production of 8 Inch Halfmoon Part for LPE Reactor. We have accumulated rich experience over the years, especially in SiC coating materials, and are committed to providing efficient solutions tailored for LPE epitaxial reactors. Our 8 Inch Halfmoon Part for LPE Reactor has excellent performance and compatibility, and is an indispensable key component in epitaxial manufacturing. Welcome your inquiry to learn more about our products.
  • High Purity Porous Graphite

    High Purity Porous Graphite

    High Purity Porous Graphite provided by VeTek Semiconductor is an advanced semiconductor processing material. It is made of high-purity carbon material with excellent thermal conductivity, good chemical stability and excellent mechanical strength. This High Purity Porous Graphite plays an important role in the growth process of single crystal SiC. VeTek Semiconductor is committed to providing quality products at competitive prices and looks forward to becoming your long-term partner in China.Welcome to consult at any time.
  • Glassy Carbon Coated Graphite Crucible

    Glassy Carbon Coated Graphite Crucible

    Customized Glassy Carbon Coated Graphite Crucible is a high-end product for E-beam Guns, silicon single crystal pulling, epitaxy.Through years of technical accumulation,Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance. It offers enhanced durability against scratching and other friction, also reduces the generation of dust. Welcome to visit our factory for more information.
  • Silicon Carbide Focus ring

    Silicon Carbide Focus ring

    Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.

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