Products

The CVD TaC Coated Graphite Ring by Veteksemicon is engineered to meet the extreme demands of semiconductor wafer processing. Utilizing Chemical Vapor Deposition (CVD) technology, a dense and uniform Tantalum Carbide (TaC) coating is applied to high-purity graphite substrates, achieving exceptional hardness, wear resistance, and chemical inertness. In semiconductor fabrication, the CVD TaC Coated Graphite Ring is widely used in MOCVD, etching, diffusion, and epitaxial growth chambers, serving as a key structural or sealing component for wafer carriers, susceptors, and shielding assemblies. Looking forward to your further consultation.

The porous TaC coated graphite ring produced by VETEK uses a lightweight porous graphite substrate and is coated with a high-purity tantalum carbide coating, featuring excellent resistance to high temperatures, corrosive gases and plasma erosion

The Silicon Carbide Cantilever Paddle from Veteksemicon is engineered for advanced wafer processing in semiconductor manufacturing. Made of high-purity SiC, it delivers outstanding thermal stability, superior mechanical strength, and excellent resistance to high temperatures and corrosive environments. These features ensure precise wafer handling, extended service life, and reliable performance in processes such as MOCVD, epitaxy, and diffusion. Welcome to consult.

Veteksemicon SiC Ceramic Vacuum Chuck for Wafer is engineered to deliver exceptional precision and reliability in semiconductor wafer processing. Manufactured from high-purity silicon carbide, it ensures excellent thermal conductivity, chemical resistance, and superior mechanical strength, making it ideal for demanding applications such as etching, deposition, and lithography. Its ultra-flat surface guarantees stable wafer support, minimizing defects and improving process yield. this vacuum chuck is the trusted choice for high-performance wafer handling.

Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.

In the critical steps of wafer cleaning, etching, and wet etching, high-purity quartz bath is more than just a container; it's the first line of defense for process success. Metal ion contamination, thermal shock cracking, chemical attack, and particle residue are hidden causes of yield fluctuations. Veteksemi is deeply rooted in semiconductor-grade quartz. Every quartz bath we manufacture is designed to provide uncompromising reliability and cleanliness for your cutting-edge processes.