High Purity Quartz Wafer Carrier

1. Key Features & Advantages

• Ultra-high purity dehydroxylated fused quartz (SiO₂ ≥ 99.999%) with metal impurities controlled at ppb levels—minimizing wafer contamination

• Long-term operating temperature up to 1100 °C; short-term peak resistance to 1200 °C

• Excellent thermal shock resistance and dimensional stability under frequent temperature cycling

• Strong chemical inertness against oxidizing process gases and common wet-process chemicals (HF, H₂O₂, acids/alkalis)

• High flatness and precision-ground surface with rounded edges for uniform wafer support and reduced edge damage

• Low vacuum outgassing and low surface adsorption—suitable for precision vacuum processes

• Fully customizable structures: solid carriers, perforated/vented designs, stepped locating features, positioning holes, multi-point supports, and thickened anti-deformation designs for 2–12 inch wafers

2. Typical Applications

These carriers are used wherever wafers need clean, dimensionally stable support under elevated temperature or aggressive chemistry:

• Diffusion and annealing furnace loading

• PECVD and LPCVD film growth process support

• Vacuum chamber and high-temperature process tooling

• Post-etch drying and wet-clean station carriers

• SiC and GaN power-device thermal processing

• Optoelectronic substrate handling and laboratory thermal tools

3. Key Technical Parameters

• Base material: semiconductor-grade dehydroxylated fused quartz, SiO₂ ≥ 99.999%

• Compatible wafer sizes: 2, 4, 6, 8, and 12 inch (Si, SiC, GaN, sapphire)

• Recommended continuous temperature range: −20 °C to 1100 °C; short-term peak up to approximately 1200 °C

• Manufacturing route: one-piece forming, precision surface grinding, edge rounding, stress-relief annealing, and ultra-clean final cleaning

• Available configurations: solid, vented/perforated, stepped locating, hole-patterned, and fully custom geometries

• Performance focus: high purity, thermal stability, corrosion resistance, surface flatness, low outgassing, and long-term dimensional retention

• Customization scope: outer dimensions, thickness, support geometry, hole layout, and special features based on customer drawings

4. Why Choose VeTek High Purity Quartz Wafer Carriers?

As a professional manufacturer of semiconductor quartz components, VeTek Semiconductor offers:

• High Purity Quartz Wafer Carriers engineered for thermal, vacuum, and wet-process environments

• Strict purity control, surface flatness, and cleanliness suitable for advanced semiconductor production

• Full customization and OEM-compatible designs for furnace, chamber, and process-station tooling

• Complementary semiconductor quartz products including furnace tubes, wafer boats, crucibles, and other process components

Our High Purity Quartz Wafer Carriers help maintain uniform thermal contact, reduce particle and metal contamination, and extend tooling life under continuous high-temperature and corrosive process conditions—supporting higher yield and lower cost of ownership in semiconductor manufacturing.