Web Menu

Product Search

Language

Products

China wafer substrate Manufacturer, Supplier, Factory

Our pursuit and company goal is to "Always satisfy our customer requirements". We continue to develop and design superior quality products for both our old and new customers and achieve a win-win prospect for our clients as well as us for wafer substrate, LPE SI EPI Susceptor Set, Si EPI Susceptor, CVD SiC coating, LPE (Liquid Phase Epitaxy) process, Never-ending improvement and striving for 0% deficiency are our two main good quality policies. Should you need anything, do not hesitate to call us.
wafer substrate, Further, we've been supported by highly experienced and knowledgeable professionals, who have immense expertise in their respective domain. These professionals work in close coordination with each other to provide our clients an effective range of goods.

Related Products

Hot Products

  • EPI susceptor

    EPI susceptor

    The EPI susceptor is designed for the demanding epitaxial equipment applications. Its high-purity silicon carbide (SiC) coated graphite structure offers excellent heat resistance, uniform thermal uniformity for consistent epitaxial layer thickness and resistance, and long-lasting chemical resistance. We look forward to cooperating with you.
  • CVD SiC Coated Barrel Susceptor

    CVD SiC Coated Barrel Susceptor

    VeTek Semiconductor is a leading manufacturer and innovator of CVD SiC Coated graphite Susceptor in China. Our CVD SiC Coated Barrel Susceptor plays a key role in promoting the epitaxial growth of semiconductor materials on wafers with its excellent product characteristics. Welcome to your further consultation.
  • Porous SiC Vacuum Chuck

    Porous SiC Vacuum Chuck

    Vetek Semiconductor's Porous SiC Vacuum Chuck is usually used in key components of semiconductor manufacturing equipment, especially when it comes to CVD and PECVD processes. Vetek Semiconductor specializes in manufacturing and supplying high-performance Porous SiC Vacuum Chuck. Welcome for your further inquiries.
  • SiC Coated Wafer Carrier for Etching

    SiC Coated Wafer Carrier for Etching

    As a leading Chinese manufacturer and supplier of Silicon Carbide Coating products, Veteksemicon's SiC Coated Wafer Carrier for Etching plays an irreplaceable core role in the etching process with its excellent high temperature stability, outstanding corrosion resistance and high thermal conductivity.
  • Physical Vapor Deposition

    Physical Vapor Deposition

    Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
  • Fused Opaque Quartz

    Fused Opaque Quartz

    As a VeTek Semiconductor's fused opaque quartz features low transmittance and high thermal reflectivity, which can significantly reduce heat loss and thereby extend the life of heating components. Ultra-long service life, suitable for semiconductor heat treatment processes. VeTek Semiconductor is a professional supplier and manufacturer of fused opaque quartz and looks forward to becoming your long-term partner.

  • Silicon(Si) epitaxy preparation technology

    Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

  • How Porous Graphite Enhances Silicon Carbide Crystal Growth?

    This blog takes "How Porous Graphite Enhances Silicon Carbide Crystal Growth?" as its theme, and discusses in detail Porous Graphite Key Takeaways, The Role of Silicon Carbide in Semiconductor Technology, Unique Properties of Porous Graphite, How Porous Graphite Optimizes the PVT Process, Innovations in Porous Graphite Materials and other angles.

  • What is SiC Ceramic?

    SiC ceramic is a ceramic material produced by the reaction of silicon (Si) and carbon (C) elements, featuring extremely high hardness, heat resistance and chemical stability

  • Chinese companies are reportedly developing 5nm chips with Broadcom!

    According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

    This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept