Products

China sic wafer manufacturers Manufacturer, Supplier, Factory

We know that we only thrive if we could guarantee our combined price tag competiveness and quality advantageous at the same time for sic wafer manufacturers, CVD SiC coating Dummy wafer, SiC Dummy Wafer, cvd diamond wafer, cvd sic coating, Our ultimate goal is to rank as a top brand and to lead as a pioneer in our field. We are sure our successful experience in tool production will win customer's trust, Wish to co-operate and co-create a better future with you!
sic wafer manufacturers, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We have been always here working for your demands whenever you want.

Hot Products

  • Glassy Carbon Crucible

    Glassy Carbon Crucible

    As a leading Chinese manufacturer of Glassy Carbon products, Veteksemicon's Glassy Carbon Crucibles are widely used in the semiconductor manufacturing field due to their excellent ultra-high purity, zero porosity, anti-permeation and excellent chemical corrosion resistance, and have won high praise from European and American customers. Welcome to your inquiry.
  • Tantalum Carbide Coated Planetary Rotation Disk

    Tantalum Carbide Coated Planetary Rotation Disk

    VeTek Semiconductor is a leading manufacturer and supplier of Tantalum Carbide Coated Planetary Rotation Disk in China, focusing on TaC coating technology for many years. Our products have high purity and excellent high temperature resistance, which are widely recognized by semiconductor manufacturers. VeTek Semiconductor Tantalum Carbide Coated Planetary Rotation Disk has become the backbone of the wafer epitaxy industry. We look forward to establishing a long-term partnership with you to jointly promote technological progress and production optimization.
  • High Purity Graphite Paper

    High Purity Graphite Paper

    The high purity graphite paper provided by VeTek Semiconductor is a reliable and efficient sealing solution. High-purity graphite paper is a sealing material made of advanced graphite materials with excellent performance and reliability. It has excellent high-temperature resistance and can withstand sealing requirements under extreme temperature conditions. Welcome to inquire at any time. We look forward to becoming your long-term partner in China.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Solid SiC Focus Ring

    Solid SiC Focus Ring

    Veteksemi solid SiC focus ring significantly improves etching uniformity and process stability by precisely controlling the electric field and airflow at the wafer edge. It is widely used in precision etching processes for silicon, dielectrics, and compound semiconductor materials, and is a key component for ensuring mass production yield and long-term reliable equipment operation.
  • Silicon Cassette Boat

    Silicon Cassette Boat

    The Silicon Cassette Boat from Veteksemicon is a precision-engineered wafer carrier developed specifically for high-temperature semiconductor furnace applications, including oxidation, diffusion, drive-in, and annealing. Fabricated from ultra-high-purity silicon and finished to advanced contamination-control standards, it provides a thermally stable, chemically inert platform that closely matches the properties of silicon wafers themselves. This alignment minimizes thermal stress, reduces slip and defect formation, and ensures exceptionally uniform heat distribution throughout the batch

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept