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China SiC Coated Graphite Lid Cover Manufacturer, Supplier, Factory

We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of SiC Coated Graphite Lid Cover, CVD TaC Coating Cover, TaC Coated Cover, TaC Coating Graphite Cover, Aixtron MOCVD system, Welcome around the world customers to make contact with us for enterprise and long-term cooperation. We're going to be your trustworthy partner and supplier of auto pieces and accessories in China.
SiC Coated Graphite Lid Cover, Our products have mainly exported to south-east Asia Euro-America, and sales to all of our country. And depending on excellent quality, reasonable price, best service, we have got good feedback from customers overseas. You are welcomed to join us for more possibilities and benefits. We welcome customers, business associations and friends from all parts of the world to contact us and seek cooperation for mutual benefits.

Hot Products

  • Silicon Carbide Robot Arm

    Silicon Carbide Robot Arm

    Our silicon carbide (SiC) robotic arm is designed for high-performance wafer handling in advanced semiconductor manufacturing. Made of high-purity silicon carbide, this robotic arm offers exceptional resistance to high temperatures, plasma corrosion, and chemical attack, ensuring reliable operation in demanding cleanroom environments. Its exceptional mechanical strength and dimensional stability enable precise wafer handling while minimizing contamination risks, making it an ideal choice for MOCVD, epitaxy, ion implantation, and other critical wafer handling applications. We welcome your inquiries.
  • Vacuum chuck

    Vacuum chuck

    Veteksemicon is a leading vacuum chuck manufacturer in China, Our ceramic vacuum chuck serves as a high - end vacuum adsorption device oriented towards accurately adsorbing and immobilizing wafers and ingots. Welcome your inquiry.
  • Large sized resistance heating SiC crystal growth furnace

    Large sized resistance heating SiC crystal growth furnace

    Silicon carbide crystal growth is a core process in the manufacturing of high-performance semiconductor devices. The stability, precision, and compatibility of crystal growth equipment directly determine the quality and yield of silicon carbide ingots. Based on the characteristics of Physical Vapor Transport (PVT) technology, Veteksemi has developed a resistance heating furnace for silicon carbide crystal growth, enabling stable growth of 6-inch, 8-inch, and 12-inch silicon carbide crystals with full compatibility with conductive, semi-insulating, and N-type material systems. Through precise control of temperature, pressure, and power, it effectively reduces crystal defects such as EPD (Etch Pit Density) and BPD (Basal Plane Dislocation), while featuring low energy consumption and a compact design to meet the high standards of industrial large-scale production.
  • Chemical Vapor Deposition Process Solid SiC Edge Ring

    Chemical Vapor Deposition Process Solid SiC Edge Ring

    VeTek Semiconductor has always been committed to the research and development and manufacturing of advanced semiconductor materials. Today, VeTek Semiconductor has made great progress in Chemical Vapor Deposition Process Solid SiC Edge Ring products and is able to provide customers with highly customized solid SiC edge rings. Solid SiC edge rings provide better etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results. Looking forward to your inquiry and becoming each other's long-term partners.
  • Silicon Carbide wafer Carrier

    Silicon Carbide wafer Carrier

    As a professional Silicon Carbide wafer carrier supplier in China, VeTek Semiconductor SiC wafer carrier is a tool specially used for handling and processing semiconductor wafers, which plays an irreplaceable role in the semiconductor wafer process. Welcome to your further consultation.
  • Porous SiC Ceramic Chuck

    Porous SiC Ceramic Chuck

    Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.

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