China Si Epitaxy Manufacturer, Supplier, Factory

VeTek Semiconductor is a professional manufacturer of MOCVD LED Epi Susceptor in China. our MOCVD LED Epi Susceptor is designed for demanding epitaxial equipment applications. Its high thermal conductivity, chemical stability and durability are key factors to ensure a stable epitaxial growth process and semiconductor film production.

The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.

Veteksemicon’s SiC Block is designed for high-efficiency grinding and thinning of silicon and sapphire wafers. With excellent thermal conductivity (≥120 W/m·K), high thermal shock resistance, and superior wear resistance (Mohs ≥9), our blocks improve process stability and reduce tool change frequency. Available in sizes from 120mm to 480mm, with customized options and fast delivery to meet diverse production needs.

The SiC coated graphite crucible deflector is a key component in the single crystal furnace equipment, its task is to guide the molten material from the crucible to the crystal growth zone smoothly, and ensure the quality and shape of the single crystal growth.Vetek semiconductor can provide both graphite and SiC coating material.Welcome to contact us for more details.

Our SiC coated sealing ring for Epitaxy is a high-performance sealing component based on graphite or carbon-carbon composites coated with high-purity silicon carbide (SiC) by chemical vapor deposition (CVD), which combines the thermal stability of graphite with the extreme environmental resistance of SiC, and is designed for semiconductor epitaxial equipment (e.g., MOCVD, MBE).

The SiC coating ALD susceptor is a support component specifically used in the atomic layer deposition (ALD) process. It plays a key role in the ALD equipment, ensuring the uniformity and precision of the deposition process. We believe that our ALD Planetary Susceptor products can bring you high-quality product solutions.