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epitaxial process, Our company has already had a lot of top factories and expert technology teams in China, offering the best solutions, techniques and services to worldwide customers. Honesty is our principle, professional operation is our work, service is our goal, and customers' satisfaction is our future!

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  • TaC Coating Crucible

    TaC Coating Crucible

    As a professional TaC Coating Crucible Supplier and Manufacturer in China, VeTek Semiconductor's TaC Coating Crucible plays an irreplaceable role in the Single crystal growth process of semiconductors with its excellent thermal conductivity, outstanding chemical stability and enhanced corrosion resistance. Welcome your further inquiries.
  • Silicon Carbide Ceramic Coating

    Silicon Carbide Ceramic Coating

    As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
  • Hot Zone graphite heater

    Hot Zone graphite heater

    Veteksemicon Hot Zone graphite heater is designed to handle the extreme conditions in high temperature furnaces and maintain excellent performance and stability in complex processes such as chemical vapor deposition (CVD), epitaxial growth and high temperature annealing. Veteksemicon always focuses on producing and providing high-quality Hot Zone graphite heaters. We sincerely invite you to contact us.
  • MOCVD SiC coating susceptor

    MOCVD SiC coating susceptor

    VeTek Semiconductor is a leading manufacturer and supplier of MOCVD SiC coating susceptors in China, focusing on the R&D and production of SiC coating products for many years. Our MOCVD SiC coating susceptors have excellent high temperature tolerance, good thermal conductivity, and low thermal expansion coefficient, playing a key role in supporting and heating silicon or silicon carbide (SiC) wafers and uniform gas deposition. Welcome to consult further.
  • CVD SiC Focus Ring

    CVD SiC Focus Ring

    VeTek Semiconductor is a leading domestic manufacturer and supplier of CVD SiC focus rings, dedicated to providing high-performance, high-reliability product solutions for the semiconductor industry. VeTek Semiconductor's CVD SiC focus rings use advanced chemical vapor deposition (CVD) technology, have excellent high temperature resistance, corrosion resistance and thermal conductivity, and are widely used in semiconductor lithography processes. Your inquiries are always welcome.
  • SiC Coating Cover Segments Inner

    SiC Coating Cover Segments Inner

    At VeTek Semiconductor, we specialize in the research, development, and industrialization of CVD SiC coating and CVD TaC coating. One exemplary product is the SiC Coating Cover Segments Inner, which undergoes extensive processing to achieve a highly precise and densely coated CVD SiC surface. This coating demonstrates exceptional resistance to high temperatures and provides robust corrosion protection. Feel free to contact us for any inquiries.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

  • Three SiC single crystal growth technologies

    The main methods for growing SiC single crystals are: physical vapor transport (PVT), high temperature chemical vapor deposition (HTCVD) and high temperature solution growth (HTSG).

  • What is Tantalum Carbide TaC Coating? - Veteksemicon

    This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD technology, introduces Veteksemicon's most popular TaC coating, and briefly analyzes the reasons for choosing Veteksemicon.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

    As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

  • Application of carbon-based thermal field materials in silicon carbide crystal growth

    Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

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