Web Menu

Product Search

Language

Products

China CMP polishing slurry Manufacturer Manufacturer, Supplier, Factory

We're experienced manufacturer. Wining the majority in the crucial certifications of its market for CMP polishing slurry Manufacturer, Chemical mechanical polishing cmp process, Chemical mechanical planarization, Cmp chemical mechanical polishing, Polishing wafer, For even more information and facts, make sure you don't be reluctant to contact us. All inquiries from you might be highly appreciated.
CMP polishing slurry Manufacturer, Our solutions are mainly exported to Europe, Africa, America, the Middle East and Southeast Asia and other countries and regions. We now have enjoyed a great reputation among our customers for quality products and good services.We would make friends with businessmen from at home and abroad, following the purpose of "Quality First, Reputation First, the Best Services."

Related Products

Hot Products

  • Silicon Carbide (SiC) Cantilever Paddle

    Silicon Carbide (SiC) Cantilever Paddle

    The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.
  • CVD SiC coating rigid felt

    CVD SiC coating rigid felt

    As an important part of the SiC coating halfmoon graphite parts, CVD SiC coating rigid felt plays an important role in heat preservation during the SiC epitaxial growth process. VeTek Semiconductor is a mature CVD SiC coating rigid felt manufacturer and supplier, which can provide customers with suitable and excellent CVD SiC coating rigid felt products. VeTek Semiconductor looks forward to becoming your long-term partner in the epitaxial industry.
  • TaC Coating Rotation Plate

    TaC Coating Rotation Plate

    TaC Coating Rotation Plate produced by VeTek Semiconductor boasts an outstanding TaC coating,With its exceptional TaC coating, TaC Coating Rotation Plate boasts have remarkable high-temperature resistance and chemical inertness,that set it apart from traditional solutions.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Horizontal SiC Wafer Carrier

    Horizontal SiC Wafer Carrier

    VeTek Semiconductor is a professional manufacturer and supplier of TaC coated guide ring, horizontal SiC wafer carrier, and SiC coated susceptors in China. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry. Welcome to contact us.
  • CVD SiC coating barrel susceptor

    CVD SiC coating barrel susceptor

    VeTek Semiconductor CVD SiC coating barrel susceptor is the core component of the barrel type epitaxial furnace.With the help of CVD SiC coating barrel susceptor, the quantity and quality of epitaxial growth are greatly improved.VeTek Semiconductor is a professional manufacturer and supplier of SiC Coated Barrel Susceptor, and is at the leading level in China and even in the world.VeTek Semiconductor looks forward to establishing a close cooperative relationship with you in the semiconductor industry.
  • SiC Coated Barrel Susceptor

    SiC Coated Barrel Susceptor

    Epitaxy is a technique used in semiconductor device manufacturing to grow new crystals on an existing chip to make a new semiconductor layer.VeTek Semiconductor offers a comprehensive set of component solutions for LPE silicon epitaxy reaction chambers, delivering long lifespan, stable quality, and improved epitaxial layer yield. Our product such as SiC Coated Barrel Susceptor received position feedback from customers. We also provide technical support for Si Epi, SiC Epi, MOCVD, UV-LED Epitaxy, and more. Feel free to inquire for pricing information.

  • What is Silicon Wafer CMP Polishing Slurry?

    Silicon wafer CMP (Chemical Mechanical Planarization) polishing slurry is a critical component in the semiconductor manufacturing process. It plays a pivotal role in ensuring that silicon wafers—used to create integrated circuits (ICs) and microchips—are polished to the exact level of smoothness required for the next stages of production

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • Can Isotropic Graphite Withstand Extreme Heat in High-Temperature Furnaces

    At VETEK, we’ve spent decades refining our isotropic graphite solutions for industries that demand reliability at soaring temperatures. Let’s dive into why this material is a top choice—and how our products outperform the competition.

  • ALD Atomic Layer Deposition Recipe

    Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

  • Summary of Silicon Carbide (SiC) Manufacturing Process

    Silicon carbide abrasives are typically produced using quartz and petroleum coke as primary raw materials. In the preparatory stage, these materials undergo mechanical processing to achieve the desired particle size before being chemically proportioned into furnace charge.

  • Three SiC single crystal growth technologies

    The main methods for growing SiC single crystals are: physical vapor transport (PVT), high temperature chemical vapor deposition (HTCVD) and high temperature solution growth (HTSG).

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept