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China Chemical mechanical polishing cmp process Manufacturer, Supplier, Factory

That has a sound business credit history, outstanding after-sales service and modern producing facilities, we have earned an superb popularity amid our buyers across the planet for Chemical mechanical polishing cmp process, Chemical mechanical planarization, Cmp chemical mechanical polishing, Polishing wafer, Planarization process, We invites both you and your company to prosper together with us and share a brilliant long run in worldwide market place.
Chemical mechanical polishing cmp process, We only supply quality goods and we believe this is the only way to keep business continue. We can supply custom service too such as Logo, custom size, or custom products and solutions etc that can according to customer's requirement.

Hot Products

  • SiC Coating Susceptor

    SiC Coating Susceptor

    Vetek Semiconductor focuses on the research and development and industrialization of CVD SiC coating and CVD TaC coating. Taking SiC coating susceptor as an example, the product is highly processed with high precision, dense CVD SIC coating, high temperature resistance and strong corrosion resistance. Your inquiry into us is welcome.
  • Large sized resistance heating SiC crystal growth furnace

    Large sized resistance heating SiC crystal growth furnace

    Silicon carbide crystal growth is a core process in the manufacturing of high-performance semiconductor devices. The stability, precision, and compatibility of crystal growth equipment directly determine the quality and yield of silicon carbide ingots. Based on the characteristics of Physical Vapor Transport (PVT) technology, Veteksemi has developed a resistance heating furnace for silicon carbide crystal growth, enabling stable growth of 6-inch, 8-inch, and 12-inch silicon carbide crystals with full compatibility with conductive, semi-insulating, and N-type material systems. Through precise control of temperature, pressure, and power, it effectively reduces crystal defects such as EPD (Etch Pit Density) and BPD (Basal Plane Dislocation), while featuring low energy consumption and a compact design to meet the high standards of industrial large-scale production.
  • C/C Composite Crucible

    C/C Composite Crucible

    Designed for the harsh environment of silicon single crystal production, the C/C Composite Crucible is an indispensable component of the semiconductor silicon single crystal production process.
  • SiC Coated Graphite Crucible Deflector

    SiC Coated Graphite Crucible Deflector

    The SiC coated graphite crucible deflector is a key component in the single crystal furnace equipment, its task is to guide the molten material from the crucible to the crystal growth zone smoothly, and ensure the quality and shape of the single crystal growth.Vetek semiconductor can provide both graphite and SiC coating material.Welcome to contact us for more details.
  • Semiconductor Ceramic Nozzle

    Semiconductor Ceramic Nozzle

    Semiconductor ceramic nozzle from VeTeK Semiconductor are carefully manufactured with excellent uniformity and precision. As a professional Semiconductor ceramic nozzle manufacturer and supplier, VeTeKSemi is always committed to providing the highest quality Ceramic Nozzle products at competitive prices. Welcome your further consultation.
  • SiC coated Satellite cover for MOCVD

    SiC coated Satellite cover for MOCVD

    SiC coated satellite cover for MOCVD plays an irreplaceable role in ensuring high-quality epitaxial growth on wafers due to its extremely high temperature resistance, excellent corrosion resistance and outstanding oxidation resistance.

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