Products

Products

View as  
 
CVD SiC coated wafer susceptor

CVD SiC coated wafer susceptor

Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
SiC Coated Planetary Susceptor

SiC Coated Planetary Susceptor

Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.
Porous SiC Ceramic Plate

Porous SiC Ceramic Plate

Our porous SiC ceramic plates are porous ceramic materials made of silicon carbide as the main component and processed by special processes. They are indispensable materials in semiconductor manufacturing, chemical vapor deposition (CVD) and other processes.
SiC coated sealing ring for Epitaxy

SiC coated sealing ring for Epitaxy

Our SiC coated sealing ring for Epitaxy is a high-performance sealing component based on graphite or carbon-carbon composites coated with high-purity silicon carbide (SiC) by chemical vapor deposition (CVD), which combines the thermal stability of graphite with the extreme environmental resistance of SiC, and is designed for semiconductor epitaxial equipment (e.g., MOCVD, MBE).
High purity quartz boat

High purity quartz boat

Our High purity quartz boat is made of fused quartz (SiO₂ content ≥ 99.99%). With its excellent resistance to extreme environments, low thermal expansion coefficient, and long life cycle, it has become an irreplaceable key consumable in the semiconductor and new energy industries.
Focus ring for Etching

Focus ring for Etching

Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept