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China Tantalum Carbide Coated Cover Manufacturer, Supplier, Factory

It really is a good way to further improve our goods and service. Our mission would be to acquire inventive items to buyers with a very good encounter for Tantalum Carbide Coated Cover, TaC Coating Rotation Plate, TaC Coated Graphite Parts, rotation plate based TaC Coating, TaC Coated Disc Susceptor, We are keeping durable business relationships with more than 200 wholesalers in the USA, the UK, Germany and Canada. If you are interested in any of our products, please feel free to contact us.
Tantalum Carbide Coated Cover, We've got more than 200 staff including experienced managers, creative designers, sophisticated engineers and skilled workers. Through hard work of all employees for the past 20 years own company grew stronger and stronger. We always apply the "client first" principle. We also always fulfill all contracts to the point and therefore enjoy excellent reputation and trust among our customers. You are very welcome to personally visit our company.We hope to start a business partnership on the basis of mutual benefit and successful development . For more information make sure you do no hesitate to contact us.

Hot Products

  • Tantalum Carbide Guide Ring

    Tantalum Carbide Guide Ring

    VeTek Semiconductor is a professional manufacturer and leader of Tantalum Carbide Guide Ring products in China. Our Tantalum Carbide (TaC) Guide Ring is a high-performance ring component made of tantalum carbide, which is commonly used in semiconductor processing equipment, especially in high-temperature and highly corrosive environments such as CVD, PVD, etching and diffusion. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
  • CVD SiC Block for SiC Crystal Growth

    CVD SiC Block for SiC Crystal Growth

    CVD SiC Block for SiC Crystal Growth, is a new high purity raw material developed by Vetek Semiconductor. It has a high input-output ratio and can grow high-quality, large-size silicon carbide single crystals, which is a second-generation material to replace the powder used in the market today. Welcome to discuss technical issues.
  • TaC Coating Planetary Susceptor

    TaC Coating Planetary Susceptor

    TaC Coating Planetary Susceptor is an exceptional product for Aixtron epitaxy equipment. VeTek Semiconductor's TaC coating provides excellent high-temperature resistance and chemical inertness. This unique combination ensures reliable performance and long service life, even in demanding environments. VeTek is committed to providing high-quality products and serving as a long-term partner in the Chinese market with competitive pricing.
  • MOCVD Susceptor with TaC Coating

    MOCVD Susceptor with TaC Coating

    VeTek Semiconductor is a comprehensive supplier involved in the research, development, production, design, and sales of TaC coatings and SiC coating parts. Our expertise lies in the production of state-of-the-art MOCVD Susceptor with TaC Coating, which play a vital role in the LED epitaxy process. We welcome you to discuss with us inquiries and further information.
  • High Purity Porous Graphite

    High Purity Porous Graphite

    High Purity Porous Graphite provided by VeTek Semiconductor is an advanced semiconductor processing material. It is made of high-purity carbon material with excellent thermal conductivity, good chemical stability and excellent mechanical strength. This High Purity Porous Graphite plays an important role in the growth process of single crystal SiC. VeTek Semiconductor is committed to providing quality products at competitive prices and looks forward to becoming your long-term partner in China.Welcome to consult at any time.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.

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