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China TaC Coated Wafer Carriers Manufacturer, Supplier, Factory

Our growth depends within the innovative equipment, fantastic talents and repeatedly strengthened technology forces for TaC Coated Wafer Carriers, TaC Coated Crucible, TaC Coated Rings, TaC Coated Porous Graphite, TaC Coated Graphite Susceptor, Our experienced specialized workforce will probably be wholeheartedly at your provider. We sincerely welcome you to check out our web-site and organization and mail us your inquiry.
TaC Coated Wafer Carriers, We are eager to cooperate with foreign companies which care much on the real quality, stable supply, strong capability and good service. We can offer the most competitive price with high quality,because we are much MORE PROFESSIONAL. You are welcomed to visit our company at any time.

Hot Products

  • Silicon Carbide Carrier Plate For LED Etching

    Silicon Carbide Carrier Plate For LED Etching

    Veteksemicon Silicon Carbide Carrier Plate For LED Etching, specifically designed for LED chip manufacturing, is a core consumable in the etching process. Made from precision-sintered high-purity silicon carbide, it offers exceptional chemical resistance and high-temperature dimensional stability, effectively resisting corrosion from strong acids, bases, and plasma. Its low contamination properties ensure high yields for LED epitaxial wafers, while its durability, far exceeding that of traditional materials, helps customers reduce overall operating costs, making it a reliable choice for improving etching process efficiency and consistency.
  • UV LED Epi Susceptor

    UV LED Epi Susceptor

    As a China leading semiconductor susceptor product manufacturer and leader, VeTek Semiconductor has been focusing on various types of suceptor products such as UV LED Epi Susceptor, SiC Coating Susceptor, MOCVD Susceptor. VeTekSemi supports customized product services and looks forward to your consultation.
  • Silicon Carbide Seal Ring

    Silicon Carbide Seal Ring

    As a professional Silicon Carbide Seal Ring product manufacturer and factory in China, VeTek Semiconductor Silicon Carbide Seal Ring is widely used in semiconductor processing equipment due to its excellent heat resistance, corrosion resistance, mechanical strength and thermal conductivity. It is especially suitable for processes involving high temperature and reactive gases such as CVD, PVD and plasma etching, and is a key material choice in the semiconductor manufacturing process. Your further inquiries are welcome.
  • High purity Rigid felt tube

    High purity Rigid felt tube

    VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.
  • Semiconductor grade Quartz Bell Jar

    Semiconductor grade Quartz Bell Jar

    Semiconductor grade Quartz Bell Jar is an important equipment component mainly used in high temperature, high pressure and high purity environments. It is made of high purity quartz material, has excellent thermal stability, chemical resistance and optical transparency, and is widely used in industrial fields such as semiconductor manufacturing and LED production. VeTek Semiconductor has many years of process accumulation in Semiconductor grade Quartz Bell Jar and can provide customized products according to customer needs. Looking forward to your inquiry.
  • Silicon Carbide Focus ring

    Silicon Carbide Focus ring

    Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.

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