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China Substrate Heater for MOCVD Manufacturer, Supplier, Factory

We believe in: Innovation is our soul and spirit. Excellent is our life. Buyer want is our God for Substrate Heater for MOCVD, SiC Coated graphite, SiC Coating graphite MOCVD heater, MOCVD graphite heater, MOCVD process, High-quality is factory's everyday living , Focus on customers' demand would be the source of organization survival and advancement, We adhere to honesty and good faith doing the job attitude, seeking forward towards your coming !
Substrate Heater for MOCVD, Now we have constructed strong and long co-operation relationship with an enormous quantity of companies within this business overseas. Immediate and professional after-sale service supplied by our consultant group has happy our buyers. In depth Info and parameters from the merchandise will probably be sent to you for any thorough acknowledge. Free samples may be delivered and company check out to our corporation. n Portugal for negotiation is constantly welcome. Hope to get inquiries type you and construct a long-term co-operation partnership.

Hot Products

  • SiC coated sealing ring for Epitaxy

    SiC coated sealing ring for Epitaxy

    Our SiC coated sealing ring for Epitaxy is a high-performance sealing component based on graphite or carbon-carbon composites coated with high-purity silicon carbide (SiC) by chemical vapor deposition (CVD), which combines the thermal stability of graphite with the extreme environmental resistance of SiC, and is designed for semiconductor epitaxial equipment (e.g., MOCVD, MBE).
  • Wafer Handling Robotic Arm

    Wafer Handling Robotic Arm

    Vetek Semiconductor thermal spraying technology plays a vital role in the application of wafer handling robotic arms, especially in semiconductor manufacturing environments that require high precision and high cleanliness. This technology significantly improves the durability, reliability and work efficiency of the equipment by coating special materials on the surface of the wafer handling robotic arm. Welcome to inquiry us.
  • Silicon Carbide Coating Wafer Holder

    Silicon Carbide Coating Wafer Holder

    The Silicon Carbide Coating Wafer Holder by Veteksemicon is engineered for precision and performance in advanced semiconductor processes such as MOCVD, LPCVD, and high-temperature annealing. With a uniform CVD SiC coating, this wafer holder ensures exceptional thermal conductivity, chemical inertness, and mechanical strength — essential for contamination-free, high-yield wafer processing.
  • SiC coated wafer carrier

    SiC coated wafer carrier

    As a leading SiC coated wafer carrier supplier and manufacturer in China, VeTek Semiconductor's SiC coated wafer carrier is made of high-quality graphite and CVD SiC coating, which has super stability and can work for a long time in most epitaxial reactors. VeTek Semiconductor has industry-leading processing capabilities and can meet customers' various customized requirements for SiC coated wafer carriers. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you and growing together.
  • CVD SiC coating graphite susceptor

    CVD SiC coating graphite susceptor

    VeTek Semiconductor CVD SiC coating graphite susceptor is one of the important components in the semiconductor industry such as epitaxial growth and wafer processing. It is used in MOCVD and other equipment to support the processing and handling of wafers and other high-precision materials. VeTek Semiconductor has China's leading SiC coated graphite susceptor and TaC Coated Graphite Susceptor production and manufacturing capabilities, and looks forward to your consultation.
  • MOCVD SiC coating susceptor

    MOCVD SiC coating susceptor

    VeTek Semiconductor is a leading manufacturer and supplier of MOCVD SiC coating susceptors in China, focusing on the R&D and production of SiC coating products for many years. Our MOCVD SiC coating susceptors have excellent high temperature tolerance, good thermal conductivity, and low thermal expansion coefficient, playing a key role in supporting and heating silicon or silicon carbide (SiC) wafers and uniform gas deposition. Welcome to consult further.

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