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SiC Wafer Handling, Hard work to keep making progress, innovation in the industry, make every effort to first-class enterprise. We try our best to build the scientific management model, to learn abundant expert knowledge, to develop advanced production equipment and production process , to create the first-call quality merchandise, reasonable price , high quality of service , quick delivery , to present you create new value .

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    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.
  • 4°off axis p-type SiC Wafer

    4°off axis p-type SiC Wafer

    VeTek Semiconductor is a professional Chinese manufacturer of 4°off axis p-type SiC Wafer. 4°off axis p-type SiC Wafer is a special semiconductor material used in high-performance electronic devices. VeTek Semiconductor is committed to providing advanced solutions for various SiC Wafer products. We sincerely look forward to your further consultation.
  • silicon carbide ceramic coating graphite heater

    silicon carbide ceramic coating graphite heater

    VeTek semiconductor's Silicon Carbide Ceramic Coating Graphite Heater is a high-performance heater made of graphite substrate and coated with silicon carbon ceramic (SiC) coating on its surface. With its composite material design, this product provides excellent heating solutions in semiconductor manufacturing. Welcome your inquiry.
  • Wafer Lift Pin

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    VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.
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    VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported SGL graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.

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    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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