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China ICP Etching Carrier Manufacturer, Supplier, Factory

We are experienced manufacturer. Wining the majority of the crucial certifications of its market for ICP Etching Carrier, Aixtron G5 MOCVD system, Nuflare systems, TEL CVD systems, Veeco systems, We welcome consumers, business enterprise associations and friends from all elements of your world to get in touch with us and look for cooperation for mutual rewards.
ICP Etching Carrier, Our company promises: reasonable prices, short production time and satisfactory after-sales service, we also welcome you to visit our factory at any time you want. Wish we now have a pleasant and long terms business together!!!

Hot Products

  • Silicon Carbide Robot Arm

    Silicon Carbide Robot Arm

    Our silicon carbide (SiC) robotic arm is designed for high-performance wafer handling in advanced semiconductor manufacturing. Made of high-purity silicon carbide, this robotic arm offers exceptional resistance to high temperatures, plasma corrosion, and chemical attack, ensuring reliable operation in demanding cleanroom environments. Its exceptional mechanical strength and dimensional stability enable precise wafer handling while minimizing contamination risks, making it an ideal choice for MOCVD, epitaxy, ion implantation, and other critical wafer handling applications. We welcome your inquiries.
  • TaC Coating Rotation Plate

    TaC Coating Rotation Plate

    TaC Coating Rotation Plate produced by VeTek Semiconductor boasts an outstanding TaC coating,With its exceptional TaC coating, TaC Coating Rotation Plate boasts have remarkable high-temperature resistance and chemical inertness,that set it apart from traditional solutions.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • High Purity Quartz Wafer Boat

    High Purity Quartz Wafer Boat

    VeTek Semiconductor provides high-performance High Purity Quartz Wafer Boat, designed for the most demanding applications in semiconductor and photovoltaic manufacturing. Made of high-quality quartz material, it has ultra-low contamination characteristics, ensuring the excellent performance of High Purity Quartz Wafer Boat in high temperature environments, and can effectively prevent wafer contamination. Choose VeTek Semiconductor to improve your manufacturing process. Looking forward to your inquiry at any time.
  • EPI Susceptor Parts

    EPI Susceptor Parts

    In the core process of silicon carbide epitaxial growth, Veteksemicon understands that susceptor performance directly determines the quality and production efficiency of the epitaxial layer. Our high-purity EPI susceptors, designed specifically for the SiC field, utilize a special graphite substrate and a dense CVD SiC coating. With their superior thermal stability, excellent corrosion resistance, and extremely low particle generation rate, they ensure unparalleled thickness and doping uniformity for customers even in harsh high-temperature process environments. Choosing Veteksemicon means choosing the cornerstone of reliability and performance for your advanced semiconductor manufacturing processes.
  • SiC coating Monocrystalline silicon epitaxial tray

    SiC coating Monocrystalline silicon epitaxial tray

    SiC coating Monocrystalline silicon epitaxial tray is an important accessory for monocrystalline silicon epitaxial growth furnace, ensuring minimal pollution and stable epitaxial growth environment. VeTek Semiconductor's SiC coating Monocrystalline silicon epitaxial tray has an ultra-long service life and provides a variety of customization options. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • Aixtron Satellite wafer carrier

    Aixtron Satellite wafer carrier

    VeTek Semiconductor’s Aixtron Satellite Wafer Carrier is a wafer carrier used in AIXTRON equipment, mainly used in MOCVD processes, and is particularly suitable for high-temperature and high-precision semiconductor processing processes. The carrier can provide stable wafer support and uniform film deposition during MOCVD epitaxial growth, which is essential for the layer deposition process. Welcome your further consultation.

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