Web Menu

Product Search

Language

Products

China High purity CVD SiC raw material Manufacturer, Supplier, Factory

Assume full accountability to satisfy all demands of our consumers; reach ongoing advancements by endorsing the expansion of our purchasers; come to be the final permanent cooperative partner of clients and maximize the interests of clientele for High purity CVD SiC raw material, SiC raw material, Silicon Carbide raw material, CVD SiC Block for SiC Crystal Growth, SiC material, Welcome to develop the perfectly and long standing enterprise relationships with our business to make a superb potential with each other. customers' satisfaction is our eternal pursuit!
High purity CVD SiC raw material, To achieve reciprocal advantages, our company is widely boosting our tactics of globalization in terms of communication with overseas customers, fast delivery, the best quality and long-term cooperation. Our company upholds the spirit of "innovation, harmony, team work and sharing, trails, pragmatic progress". Give us a chance and we'll prove our capability. With your kind help, we believe that we can create a bright future with you together.

Related Products

Hot Products

  • Semiconductor Quartz tank

    Semiconductor Quartz tank

    VeTek semiconductor is a leading semiconductor quartz tank manufacturer and factory in China. In fact, quartz tank is particularly important in the wet processing used in wafer manufacturing. Welcome your further inquiries.
  • CVD SiC Coated Graphite Shower Head

    CVD SiC Coated Graphite Shower Head

    The CVD SiC Coated Graphite Shower Head from Veteksemicon is a high-performance component specifically designed for semiconductor chemical vapor deposition (CVD) processes. Manufactured from high-purity graphite and protected with a chemical vapor deposition (CVD) silicon carbide (SiC) coating, this shower head delivers outstanding durability, thermal stability, and resistance to corrosive process gases. Looking forward to your further consultation.
  • High Purity Quartz Wafer Carrier

    High Purity Quartz Wafer Carrier

    VeTek Semiconductor’s High Purity Quartz Wafer Carriers are precision-engineered semiconductor-grade fixtures for stable wafer handling in high-temperature thermal processing, thin-film deposition, wet processes, and vacuum applications. Manufactured from semiconductor-grade dehydroxylated fused quartz (JGS2 equivalent), these wafer carriers deliver ultra-high purity, excellent thermal shock resistance, chemical inertness, low outgassing, and high flatness—ensuring reliable, contamination-free support for 2–12 inch silicon, SiC, GaN, and sapphire substrates.
  • Tantalum Carbide Coated Planetary Rotation Disk

    Tantalum Carbide Coated Planetary Rotation Disk

    VeTek Semiconductor is a leading manufacturer and supplier of Tantalum Carbide Coated Planetary Rotation Disk in China, focusing on TaC coating technology for many years. Our products have high purity and excellent high temperature resistance, which are widely recognized by semiconductor manufacturers. VeTek Semiconductor Tantalum Carbide Coated Planetary Rotation Disk has become the backbone of the wafer epitaxy industry. We look forward to establishing a long-term partnership with you to jointly promote technological progress and production optimization.
  • High purity graphite powder

    High purity graphite powder

    Vetek Semiconductor offers High purity graphite powder that is a high quality product with a purity of up to 5ppm and meets the highest industry standards. Customizable particle form, mainly used for silicon carbide powder and diamond synthesis, suitable for semiconductor, electronics and high-tech industries. Welcome to inquiry us!
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.

  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • Research on SIC Wafer Carrier Technology

    ​SiC wafer carriers, as key consumables in the third-generation semiconductor industry chain, their technical characteristics directly affect the yield of epitaxial growth and device manufacturing. With the surging demand for high-voltage and high-temperature devices in industries such as 5G base stations and new energy vehicles, the research and application of SiC wafer carriers are now facing significant development opportunities.

  • The Solution to the Carbon Encapsulation Defect in Silicon Carbide Substrates

    With the global energy transition, the AI revolution, and the wave of new-generation information technologies, silicon carbide (SiC) has rapidly advanced from being a "potential material" to a "strategic foundational material" due to its exceptional physical properties.

  • What Makes SiC coated graphite susceptor for ASM Essential for Stable Epitaxy Results?

    A SiC coated graphite susceptor for ASM is not just a replacement part inside an epitaxy system. It is a process-critical carrier that influences thermal uniformity, wafer cleanliness, coating durability, chamber stability, and long-term production cost.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • What is CMP Polishing Slurry Preparation Process

    In semiconductor manufacturing, Chemical Mechanical Planarization (CMP) plays a vital role. The CMP process combines chemical and mechanical actions to smooth the surface of silicon wafers, providing a uniform foundation for subsequent steps such as thin-film deposition and etching. CMP polishing slurry, as the core component of this process, significantly impacts polishing efficiency, surface quality, and the final performance of the product

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
RejectAccept