Products

China Fine powder Manufacturer, Supplier, Factory

We purpose to understand high quality disfigurement with the output and supply the top service to domestic and overseas buyers wholeheartedly for Fine powder, Artificial Graphite Powder, Carbon Powder, Natural Graphite Powder, High purity graphite, We've been willing to provide you with the lowest selling price during the market place, greatest high quality and quite nice sales service.Welcome to do bussines with us,let's be double win.
Fine powder, Our company has built stable business relationships with many well-known domestic companies as well as oversea customers. With the goal of providing high quality products to customers at low cots, we've been committed to improving its capacities in research, development, manufacturing and management. We have honored to receive recognition from our customers. Till now we have now passed ISO9001 in 2005 and ISO/TS16949 in 2008. Enterprises of "quality of survival, the credibility of development" for the purpose, sincerely welcome domestic and foreign businessmen to visit to discuss cooperation.

Hot Products

  • TaC Coated Graphite Wafer Carrier

    TaC Coated Graphite Wafer Carrier

    VeTek Semiconductor has carefully designed TaC Coated Graphite Wafer Carrier for customers. It is composed of high-purity graphite and TaC coating, which is suitable for various wafer epitaxial wafer processing. We have been specialized in SiC and TaC coating for many years. Compared with SiC coating, Our TaC coated graphite wafer carrier has a higher temperature resistance and wear-resistant. We look forward to becoming your long-term partner in China.
  • CVD TaC Coating Wafer Carrier

    CVD TaC Coating Wafer Carrier

    As a professional CVD TaC Coating Wafer Carrier product manufacturer and factory in China, VeTek Semiconductor CVD TaC Coating Wafer Carrier is a wafer carrying tool specially designed for high temperature and corrosive environments in semiconductor manufacturing. and CVD TaC Coating Wafer Carrier has high mechanical strength, excellent corrosion resistance and thermal stability, providing the necessary guarantee for manufacturing high-quality semiconductor devices. Your further inquiries are welcome.
  • SiC coated E-Chuck

    SiC coated E-Chuck

    Vetek Semiconductor is a leading manufacturer and supplier of SiC coated E-Chucks in China. SiC coated E-Chuck is specially designed for GaN wafer etching process, with excellent performance and long service life, to provide all-round support for your semiconductor manufacturing. Our strong processing ability enables us to provide you with the SiC Ceramic Susceptor you want. Looking forward to your inquire.
  • MOCVD Epitaxial Susceptor for 4

    MOCVD Epitaxial Susceptor for 4" Wafer

    MOCVD Epitaxial Susceptor for 4" Wafer is designed to grow 4" epitaxial layer.VeTek Semiconductor is a professional manufacturer and supplier, who is dedicated to providing high-quality MOCVD Epitaxial Susceptor for 4" Wafer. With tailored graphite material and SiC coating process. We are able to deliver expert and efficient solutions to our clients.You are welcome to communicate with us.
  • TaC Coating Guide Ring

    TaC Coating Guide Ring

    VeTek Semiconductor's TaC Coating Guide Ring is created by applying tantalum carbide coating onto graphite parts using a highly advanced technique called chemical vapor deposition (CVD). This method is well-established and offers exceptional coating properties. By utilizing the TaC Coating Guide Ring, the lifespan of graphite components can be significantly extended, the movement of graphite impurities can be suppressed, and the SiC and AIN single crystal quality can be reliably maintained. Welcome to inquiry us.
  • Focus ring for Etching

    Focus ring for Etching

    Focus ring for Etching is the key component to ensure process accuracy and stability. These components are precisely assembled in a vacuum chamber to achieve uniform machining of nanoscale structures on the wafer surface through precise control of plasma distribution, edge temperature and electric field uniformity.

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