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China Wafer Handling Robotic Arm Manufacturer, Supplier, Factory

It is a good way to boost our products and solutions and repair. Our mission is always to establish artistic products and solutions to consumers having a excellent expertise for Wafer Handling Robotic Arm, Wafer Handling End Effector, wafer handling, wafer handling equipment, wafer handling tools, Our items have exported to North America, Europe, Japan, Korea, Australia, New Zealand, Russia and other countries. On the lookout ahead to make up a good and long-lasting cooperation with you in coming potential!
Wafer Handling Robotic Arm, Our advantages are our innovation, flexibility and reliability which have been built during last 20 years. We focus on providing service for our clients as a key element in strengthening our long-term relationships. The continual availability of high grade products and solutions in combination with our excellent pre- and after-sales service ensures strong competitiveness in an increasingly globalized market.

Hot Products

  • Aixtron G5+ ceiling component

    Aixtron G5+ ceiling component

    VeTek Semiconductor has become a supplier of consumables for many MOCVD equipment with its superior processing capabilities. Aixtron G5+ ceiling component is one of our latest products, which is almost the same as the original Aixtron component and has received good feedback from customers. If you need such products, please contact VeTek Semiconductor!
  • CVD SiC Coating Protector

    CVD SiC Coating Protector

    Vetek Semiconductor's CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.
  • CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor

    CVD TaC coating planetary SiC epitaxial susceptor is one of the core components of MOCVD planetary reactor. Through CVD TaC coating planetary SiC epitaxial susceptor, the large disk orbits and the small disk rotates, and the horizontal flow model is extended to multi-chip machines, so that it has both the high-quality epitaxial wavelength uniformity management and defect optimization of single-chip machines and the production cost advantages of multi-chip machines.VeTek Semiconductor can provide customers with highly customized CVD TaC coating planetary SiC epitaxial susceptor. If you also want to make a planetary MOCVD furnace like Aixtron, come to us!
  • Graphite Heating Unit

    Graphite Heating Unit

    VeTek Semiconductor Graphite Heating Unit is a high-performance industrial heating solution made of high-purity graphite material, which can provide precise and efficient heating effect. Graphite Heating Unit is widely used in semiconductor, electronics, ceramics and other fields. Welcome your further inquiry.
  • MOCVD epitaxial wafer susceptor

    MOCVD epitaxial wafer susceptor

    VeTek Semiconductor has been engaged in the semiconductor epitaxial growth industry for a long time and has rich experience and process skills in MOCVD epitaxial wafer susceptor products. Today, VeTek Semiconductor has become China's leading MOCVD epitaxial wafer susceptor manufacturer and supplier, and the wafer susceptors it provides have played an important role in the manufacturing of GaN epitaxial wafers and other products.
  • CVD Silicon Carbide(SiC) Coated RTP Susceptor

    CVD Silicon Carbide(SiC) Coated RTP Susceptor

    The CVD SiC coated RTP susceptor from VeTek Semiconductor serves rapid thermal processing (RTP) and rapid thermal annealing (RTA) equipment used throughout semiconductor manufacturing. The substrate is machined from high‑purity isostatic graphite, over which a dense CVD silicon carbide (SiC) layer is deposited. This construction yields high thermal conductivity, robust chemical inertness, and sustained dimensional stability under repeated high‑temperature cycling.

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