Web Menu

Product Search

Language

Products

China Monocrystal Growth Furnace Material Manufacturer, Supplier, Factory

keep on to improve, to make sure solution good quality in line with market and shopper standard requirements. Our business has a top quality assurance program are actually established for Monocrystal Growth Furnace Material, Porous Graphite Materials for Single Crystal SiC Growth, High-purity Porous Graphite Material, Porous Graphite, Semiconductor, We welcome new and aged consumers to speak to us by telephone or send out us inquiries by mail for long term company associations and attaining mutual results.
Monocrystal Growth Furnace Material, Upon today, now we have customers from all over the world, including USA, Russia, Spain, Italy, Singapore, Malaysia, Thailand, Poland, Iran and Iraq. The mission of our company is to offer the highest quality solutions with best price. We are looking forward to doing business with you!

Related Products

Hot Products

  • Si EPI Susceptor

    Si EPI Susceptor

    China top factory-Vetek Semiconductor combines precision machining and semiconductor SiC and TaC coating capabilities. The barrel type Si Epi Susceptor provides temperature and atmosphere control capabilities, enhancing production efficiency in semiconductor epitaxial growth processes.Looking forward to setting up cooperation relationship with you.
  • Silicon Carbide wafer Carrier

    Silicon Carbide wafer Carrier

    As a professional Silicon Carbide wafer carrier supplier in China, VeTek Semiconductor SiC wafer carrier is a tool specially used for handling and processing semiconductor wafers, which plays an irreplaceable role in the semiconductor wafer process. Welcome to your further consultation.
  • Silicon Carbide (SiC) Cantilever Paddle

    Silicon Carbide (SiC) Cantilever Paddle

    The role of Silicon Carbide (SiC) Cantilever Paddle in the semiconductor industry is to support and transport wafers. In high-temperature processes such as diffusion and oxidation, SiC cantilever paddle can stably carry wafer boats and wafers without deformation or damage due to high temperature, ensuring the smooth progress of the process. Making diffusion, oxidation and other processes more uniform is crucial to improving the consistency and yield of wafer processing. VeTek Semiconductor uses advanced technology to build SiC cantilever paddle with high-purity silicon carbide to ensure that wafers will not be contaminated. VeTek Semiconductor looks forward to long-term cooperation with you on Silicon Carbide (SiC) Cantilever Paddle products.
  • Semiconductor thermal spraying technology

    Semiconductor thermal spraying technology

    Vetek Semiconductor Semiconductor thermal spraying technology is an advanced process that sprays materials in a molten or semi-molten state onto the surface of a substrate to form a coating. This technology is widely used in the field of semiconductor manufacturing, mainly used to create coatings with specific functions on the surface of the substrate, such as conductivity, insulation, corrosion resistance, and oxidation resistance. The main advantages of thermal spraying technology include high efficiency, controllable coating thickness, and good coating adhesion, making it particularly important in the semiconductor manufacturing process that requires high precision and reliability. Looking forward to your inquiry.
  • Graphite paper

    Graphite paper

    Vetek Semiconductor's High Purity Graphite Paper, a premium product designed to meet rigorous purity and performance standards. With an exceptional purity level of up to 99.9%, our graphite paper stands as a trusted option for diverse applications such as battery systems, fuel cells, thermal management solutions, semiconductor thermal fields, and beyond. Crafted through a proprietary manufacturing process, this graphite paper guarantees uniformity and consistency, delivering unparalleled electrical conductivity and thermal stability. Trust Vetek Semiconductor's High Purity Graphite Paper for reliability and excellence in your specialized projects.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.

  • How Porous Graphite Enhances Silicon Carbide Crystal Growth?

    This blog takes "How Porous Graphite Enhances Silicon Carbide Crystal Growth?" as its theme, and discusses in detail Porous Graphite Key Takeaways, The Role of Silicon Carbide in Semiconductor Technology, Unique Properties of Porous Graphite, How Porous Graphite Optimizes the PVT Process, Innovations in Porous Graphite Materials and other angles.

  • What is SiC Ceramic?

    SiC ceramic is a ceramic material produced by the reaction of silicon (Si) and carbon (C) elements, featuring extremely high hardness, heat resistance and chemical stability

  • CVD Technology Innovation Behind the Nobel Prize

    This blog discusses the specific applications of artificial intelligence in the field of CVD from two aspects: The Significance and Challenges of Chemical Vapor Deposition (CVD) Technology in Physics and CVD Technology and Machine Learning.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

  • What are silicon carbide ceramics?

    In semiconductor manufacturing, various types of semiconductor ceramic components products are needed. These products are used in different production scenarios due to their different characteristics, so as to play their corresponding functions. They are indispensable products in the semiconductor processing industry.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept