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China High-temperature silicon puller Manufacturer, Supplier, Factory

Our eternal pursuits are the attitude of "regard the market, regard the custom, regard the science" and the theory of "quality the basic, belief the very first and management the advanced" for High-temperature silicon puller, Silicon single crystal puller fixtures, Single crystal growth crucibles, Semiconductor crystal growth fixtures, silicon crystal growth, Our staff members are goal to provides solutions with high performance cost ratio to our prospects, as well as target for all of us is always to satisfy our consumers from everywhere in the globe.
High-temperature silicon puller, We adopted technique and quality system management, based on "customer orientated, reputation first, mutual benefit, develop with joint efforts", welcome friends to communicate and cooperate from all over the world.

Hot Products

  • CVD TaC Coating Cover

    CVD TaC Coating Cover

    CVD TaC coating cover provided by VeTek Semiconductor is a highly specialized component designed specifically for demanding applications. With its advanced features and exceptional performance, our CVD TaC coating cover offers several key advantages.Our CVD TaC coating cover provides the necessary protection and performance required for success.We looking forward to exploring potential cooperation with you!
  • Quartz Furnace Tube for Diffusion Furnace

    Quartz Furnace Tube for Diffusion Furnace

    VeTek Semiconductor’s high-purity quartz furnace tubes are core process chamber components for semiconductor thermal processing equipment. Manufactured from semiconductor-grade dehydroxylated fused quartz, these tubes serve as the sealed reaction cavity in oxidation furnaces, diffusion furnaces, annealing furnaces, and LPCVD systems. They deliver exceptional purity, thermal stability, and chemical resistance, ensuring uniform temperature fields, stable gas flow, and ultra-low contamination for 4/6/8/12-inch wafer processing.
  • 8 Inch Halfmoon Part for LPE Reactor

    8 Inch Halfmoon Part for LPE Reactor

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China, focusing on the R&D and production of 8 Inch Halfmoon Part for LPE Reactor. We have accumulated rich experience over the years, especially in SiC coating materials, and are committed to providing efficient solutions tailored for LPE epitaxial reactors. Our 8 Inch Halfmoon Part for LPE Reactor has excellent performance and compatibility, and is an indispensable key component in epitaxial manufacturing. Welcome your inquiry to learn more about our products.
  • High Purity Porous Graphite

    High Purity Porous Graphite

    High Purity Porous Graphite provided by VeTek Semiconductor is an advanced semiconductor processing material. It is made of high-purity carbon material with excellent thermal conductivity, good chemical stability and excellent mechanical strength. This High Purity Porous Graphite plays an important role in the growth process of single crystal SiC. VeTek Semiconductor is committed to providing quality products at competitive prices and looks forward to becoming your long-term partner in China.Welcome to consult at any time.
  • Glassy Carbon Coated Graphite Crucible

    Glassy Carbon Coated Graphite Crucible

    Customized Glassy Carbon Coated Graphite Crucible is a high-end product for E-beam Guns, silicon single crystal pulling, epitaxy.Through years of technical accumulation,Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance. It offers enhanced durability against scratching and other friction, also reduces the generation of dust. Welcome to visit our factory for more information.
  • Silicon Carbide Focus ring

    Silicon Carbide Focus ring

    Veteksemicon focus ring is designed specifically for demanding semiconductor etching equipment, particularly SiC etching applications. Mounted around the electrostatic chuck (ESC), in close proximity to the wafer, its primary function is to optimize the electromagnetic field distribution within the reaction chamber, ensuring uniform and focused plasma action across the entire wafer surface. A high-performance focus ring significantly improves etch rate uniformity and reduces edge effects, directly boosting product yield and production efficiency.

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