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Hot Products

  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • Aixtron Satellite wafer carrier

    Aixtron Satellite wafer carrier

    VeTek Semiconductor’s Aixtron Satellite Wafer Carrier is a wafer carrier used in AIXTRON equipment, mainly used in MOCVD processes, and is particularly suitable for high-temperature and high-precision semiconductor processing processes. The carrier can provide stable wafer support and uniform film deposition during MOCVD epitaxial growth, which is essential for the layer deposition process. Welcome your further consultation.
  • SiC Coating Collector Center

    SiC Coating Collector Center

    VeTek Semiconductor is a manufacturer reputable for CVD SiC coating in China, brings you the cutting-edge SiC Coating Collector Center in Aixtron G5 MOCVD system. These SiC Coating Collector Center are meticulously designed with high purity graphite and boast an advanced CVD SiC coating, ensuring high temperature stability, corrosion resistance, high purity.Looking forward to cooperating with you!
  • Porous SiC Vacuum Chuck

    Porous SiC Vacuum Chuck

    Vetek Semiconductor's Porous SiC Vacuum Chuck is usually used in key components of semiconductor manufacturing equipment, especially when it comes to CVD and PECVD processes. Vetek Semiconductor specializes in manufacturing and supplying high-performance Porous SiC Vacuum Chuck. Welcome for your further inquiries.
  • Silicon Carbide SiC wafer boat

    Silicon Carbide SiC wafer boat

    Veteksemicon SiC wafer boats are widely used in critical high-temperature processes in semiconductor manufacturing, serving as reliable carriers for oxidation, diffusion, and annealing processes for silicon-based integrated circuits. They also excel in the third-generation semiconductor sector, perfectly suited for demanding processes such as epitaxial growth (EPI) and metal-organic chemical vapor deposition (MOCVD) for SiC and GaN power devices. They also support the high-temperature fabrication of high-efficiency solar cells in the photovoltaic industry. Looking forward to your further consultation.
  • PG (Pyrolytic Graphite) Coated Ring

    PG (Pyrolytic Graphite) Coated Ring

    The VETEK PG (Pyrolytic Graphite) Coated Ring is purpose-built for semiconductor thermal field and crystal growth environments where uniform heat distribution and stable temperatures are non-negotiable. Starting with a high-purity graphite base and finished with a dense Pyrolytic Graphite coating, this component delivers exceptional thermal conductivity, stands up to severe thermal shock, and retains its dimensions over long runs at extreme temperatures. You will find these rings used extensively in crystal growth furnaces, high-temperature ovens, and thermal field assemblies for semiconductors—anywhere that precise temperature control directly drives process repeatability and final product quality.

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