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China CVD SiC Focus Ring manufacturer Manufacturer, Supplier, Factory

Fast and fantastic quotations, informed advisers to help you choose the correct products that suits all your needs, a short manufacturing time, responsible good quality control and distinct companies for paying and shipping affairs for CVD SiC Focus Ring manufacturer, CVD SiC Focus Ring, CVD SiC Coating, Semiconductor Etching process, CVD process, Currently, we're seeking ahead to even bigger cooperation with abroad customers according to mutual gains. Please experience free of charge to get in touch with us for more specifics.
CVD SiC Focus Ring manufacturer, With the goal of "zero defect". To care for the environment, and social returns, care employee social responsibility as own duty. We welcome friends from all over the world to visit and guide us so that we can achieve the win-win goal together.

Hot Products

  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • C/C Composite Crucible

    C/C Composite Crucible

    Designed for the harsh environment of silicon single crystal production, the C/C Composite Crucible is an indispensable component of the semiconductor silicon single crystal production process.
  • High purity quartz diffusion Tube

    High purity quartz diffusion Tube

    In process of Semiconductor oxidation and difffusion, high purity quartz diffusion tube is widely used. As a leading manufacturer and supplier of High purity quartz Diffusion Tube in China, VeTek Semiconductor can provide you with high-quality products. Looking forward to your inquiry.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Graphite paper

    Graphite paper

    Vetek Semiconductor's High Purity Graphite Paper, a premium product designed to meet rigorous purity and performance standards. With an exceptional purity level of up to 99.9%, our graphite paper stands as a trusted option for diverse applications such as battery systems, fuel cells, thermal management solutions, semiconductor thermal fields, and beyond. Crafted through a proprietary manufacturing process, this graphite paper guarantees uniformity and consistency, delivering unparalleled electrical conductivity and thermal stability. Trust Vetek Semiconductor's High Purity Graphite Paper for reliability and excellence in your specialized projects.
  • Solid SiC Disc-shaped Shower Head

    Solid SiC Disc-shaped Shower Head

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China and a professional manufacturer and supplier of Solid SiC Disc-shaped Shower Head. Our Disc shape Shower Head is widely used in thin film deposition production such as CVD process to ensure uniform distribution of reaction gas and is one of the core components of CVD furnace.

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