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China Monocrystal Furnace Manufacturer, Supplier, Factory

We support our consumers with ideal high-quality goods and substantial level support. Becoming the specialist manufacturer in this sector, we now have acquired abundant practical encounter in producing and managing for Monocrystal Furnace, Graphite heat field, Single crystal silicon, Single crystal furnace, Graphite crucible, Please truly feel absolutely free to call us at any time. We will reply you when we receive your inquiries. Please note that samples are available before we start our company.
Monocrystal Furnace, Our expert engineering team will generally be prepared to serve you for consultation and feedback. We're able to also give you with free of charge samples to meet your requirements. Best efforts will likely be produced to provide you the best service and merchandise. When you are keen on our business and items, make sure you speak to us by sending us emails or call us quickly. In an effort to know our merchandise and company extra, you may come to our factory to view it. We'll generally welcome guests from all over the world to our business to create business relations with us. Be sure to feel cost-free to speak to us for small business and we believe we are going to share the best trading experience with all our merchants.

Hot Products

  • 4°off axis p-type SiC Wafer

    4°off axis p-type SiC Wafer

    VeTek Semiconductor is a professional Chinese manufacturer of 4°off axis p-type SiC Wafer. 4°off axis p-type SiC Wafer is a special semiconductor material used in high-performance electronic devices. VeTek Semiconductor is committed to providing advanced solutions for various SiC Wafer products. We sincerely look forward to your further consultation.
  • Ceramic Electrostatic Chuck

    Ceramic Electrostatic Chuck

    Ceramic Electrostatic Chuck is widely used in semiconductor manufacturing and processing to fix wafers. It is an indispensable tool for high-precision wafer processing. VeTek Semiconductor is an experienced manufacturer and supplier of Ceramic Electrostatic Chuck, and can provide highly customized products according to different customer needs.
  • Silicon Carbide Cantilever Paddle

    Silicon Carbide Cantilever Paddle

    VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.Feel free to inquire us.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.
  • LPE Halfmoon SiC EPI Reactor

    LPE Halfmoon SiC EPI Reactor

    VeTek Semiconductor is a professional LPE Halfmoon SiC EPI Reactor product manufacturer, innovator and leader in China. LPE Halfmoon SiC EPI Reactor is a device specifically designed for producing high-quality silicon carbide (SiC) epitaxial layers, mainly used in the semiconductor industry. welcome to your further inquiries.
  • Solid SiC Disc-shaped Shower Head

    Solid SiC Disc-shaped Shower Head

    VeTek Semiconductor is a leading semiconductor equipment manufacturer in China and a professional manufacturer and supplier of Solid SiC Disc-shaped Shower Head. Our Disc shape Shower Head is widely used in thin film deposition production such as CVD process to ensure uniform distribution of reaction gas and is one of the core components of CVD furnace.

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