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China Polycrystalline silicon CVD reactor Manufacturer, Supplier, Factory

We emphasize advancement and introduce new products and solutions into the market each year for Polycrystalline silicon CVD reactor, Quartz Bell Jar, Quartz vacuum bell jar, Quartz glass bell jar, Quartz Bell Jar for Semiconductor, The main purpose of our company is always to live a satisfactory memory to many of the customers, and establish a lengthy time period enterprise romantic relationship with prospective buyers and users all over the environment.
Polycrystalline silicon CVD reactor, With the goal of "zero defect". To care for the environment, and social returns, care employee social responsibility as own duty. We welcome friends from all over the world to visit and guide us so that we can achieve the win-win goal together.

Hot Products

  • VEECO MOCVD Heater

    VEECO MOCVD Heater

    VeTek Semiconductor is a leading manufacturer and supplier of VEECO MOCVD heater products in China. MOCVD heater has excellent chemical purity, thermal stability and corrosion resistance. It is an indispensable product in the metal organic chemical vapor deposition (MOCVD) process. Welcome to your further inquiries.
  • TaC Coating Plate

    TaC Coating Plate

    Designed with precision and engineered to perfection, Vetek Semiconductor's TaC Coating Plate is specifically tailored for various applications in silicon carbide (SiC) single crystal growth processes.The TaC Coating Plate's precise dimensions and robust construction make it easy to integrate into existing systems, ensuring seamless compatibility and efficient operation. Its reliable performance and high-quality coating contribute to consistent and uniform results in SiC crystal growth applications.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Porous SiC Ceramic Chucks

    Porous SiC Ceramic Chucks

    The Porous SiC Ceramic Chuck by Veteksemicon is a precision-engineered vacuum platform designed for secure and particle-free wafer handling in advanced semiconductor processes such as etching, ion implantation, CMP, and inspection. Manufactured from high-purity porous silicon carbide, it offers outstanding thermal conductivity, chemical resistance, and mechanical strength. With customizable pore sizes and dimensions, Veteksemicon delivers tailored solutions to meet the stringent demands of cleanroom wafer processing environments.
  • Silicon carbide Cantilever Paddle for Wafer Processing

    Silicon carbide Cantilever Paddle for Wafer Processing

    The Silicon Carbide Cantilever Paddle from Veteksemicon is engineered for advanced wafer processing in semiconductor manufacturing. Made of high-purity SiC, it delivers outstanding thermal stability, superior mechanical strength, and excellent resistance to high temperatures and corrosive environments. These features ensure precise wafer handling, extended service life, and reliable performance in processes such as MOCVD, epitaxy, and diffusion. Welcome to consult.
  • CVD SiC coated wafer susceptor

    CVD SiC coated wafer susceptor

    Veteksemicon’s CVD SiC coated wafer susceptor is a cutting-edge solution for semiconductor epitaxial processes, offering ultra-high purity (≤100ppb, ICP-E10 certified) and exceptional thermal/chemical stability for contamination-resistant growth of GaN, SiC, and silicon-based epi-layers. Engineered with precision CVD technology, it supports 6”/8”/12” wafers, ensures minimal thermal stress, and withstands extreme temperatures up to 1600°C.
  • Ion Beam Sputter sources grid

    Ion Beam Sputter sources grid

    Ion beam is mainly used for ion etching, ion coating and plasma injection. The role of the Ion Beam Sputter sources grid is to dissect the ions and accelerate them to the required energy. Vetek Semiconductor provides high purity graphite ion beam Ion Beam Sputter sources grid for optical lens ion beam polishing, semiconductor wafer modification, etc. Welcome to inquire about customized products.

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