MOCVD Technology

VeTek Semiconductor has advantage and experience in MOCVD Technology spare parts.

MOCVD, the full name of Metal-Organic Chemical Vapor Deposition (metal-organic Chemical Vapor Deposition), can also be called metal-organic vapor phase epitaxy. Organometallic Compounds are a class of compounds with metal-carbon bonds. These compounds contain at least one chemical bond between a metal and a carbon atom. Metal-organic compounds are often used as precursors and can form thin films or nanostructures on the substrate through various deposition techniques.

Metal-organic chemical vapor deposition (MOCVD technology) is a common epitaxial growth technology, MOCVD technology is widely used in the manufacture of semiconductor lasers and leds. Especially when manufacturing leds, MOCVD is a key technology for the production of gallium nitride (GaN) and related materials.

There are two main forms of Epitaxy: Liquid Phase Epitaxy (LPE) and Vapor Phase Epitaxy (VPE). Gas phase epitaxy can be further divided into metal-organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE).

Foreign equipment manufacturers are mainly represented by Aixtron and Veeco. MOCVD system is one of the key equipment for manufacturing lasers, leds, photoelectric components, power, RF devices and solar cells.

Main features of MOCVD technology spare parts manufactured by our company:

1) High density and full encapsulation: the graphite base as a whole is in a high temperature and corrosive working environment, the surface must be fully wrapped, and the coating must have good densification to play a good protective role.

2) Good surface flatness: Because the graphite base used for single crystal growth requires a very high surface flatness, the original flatness of the base should be maintained after the coating is prepared, that is, the coating layer must be uniform.

3) Good bonding strength: Reduce the difference in the coefficient of thermal expansion between the graphite base and the coating material, which can effectively improve the bonding strength between the two, and the coating is not easy to crack after experiencing high and low temperature heat cycle.

4) High thermal conductivity: high-quality chip growth requires the graphite base to provide rapid and uniform heat, so the coating material should have a high thermal conductivity.

5) High melting point, high temperature oxidation resistance, corrosion resistance: the coating should be able to work stably in high temperature and corrosive working environment.

Place 4 inch substrate
Blue-green epitaxy for growing LED
Housed in the reaction chamber
Direct contact with the wafer Place 4 inch substrate
Used to grow UV LED epitaxial film
Housed in the reaction chamber
Direct contact with the wafer Veeco K868/Veeco K700 Machine
White LED epitaxy/Blue-green LED epitaxy Used in VEECO Equipment
For MOCVD Epitaxy
SiC Coating Susceptor Aixtron TS Equipment
Deep Ultraviolet Epitaxy
2-inch Substrate Veeco Equipment
Red-Yellow LED Epitaxy
4-inch Wafer Substrate TaC Coated Susceptor
(SiC Epi/ UV LED Susceptor) SiC Coated Susceptor
(ALD/ Si Epi/ LED MOCVD Susceptor)